Jellison G E, Boatner L A, Lowndes D H, McKee R A, Godbole M
Appl Opt. 1994 Sep 1;33(25):6053-8. doi: 10.1364/AO.33.006053.
A procedure is presented for accurately determining the thickness, optical functions, and surfaceroughness characteristics of thin-film insulators from two-channel spectroscopic polarization-modulation ellipsometry data. For films with minimal surface roughness, the optical functions can be determined over the entire measured spectrum; for rougher films, the analysis of the spectroscopic ellipsometry data yields meaningful values of the optical functions only in the transparent region. In general, the films must be transparent in a given range of wavelengths sampled by the ellipsometer so that at least two interference oscillations can be observed. The use of the procedure is illustrated with the determination of the optical functions of SrTiO(3) and BaTiO(3) thin films grown on MgO, and of SiO(x) films grown on Si. For SrTiO(3) and BaTiO(3), the thin-film results are compared with the measured optical functions of the respective bulk materials.
本文介绍了一种通过双通道光谱偏振调制椭圆偏振光谱数据精确测定薄膜绝缘体厚度、光学函数和表面粗糙度特性的方法。对于表面粗糙度极小的薄膜,可在整个测量光谱范围内确定其光学函数;对于粗糙度较大的薄膜,光谱椭圆偏振光谱数据的分析仅在透明区域能得出有意义的光学函数值。一般来说,薄膜在椭圆偏振仪采样的给定波长范围内必须是透明的,以便能观察到至少两个干涉振荡。通过测定在氧化镁上生长的SrTiO(3)和BaTiO(3)薄膜以及在硅上生长的SiO(x)薄膜的光学函数,说明了该方法的应用。对于SrTiO(3)和BaTiO(3),将薄膜的结果与相应块状材料的测量光学函数进行了比较。