Larruquert J I, Méndez J A, Aznárez J A
Appl Opt. 1995 Aug 1;34(22):4892-9. doi: 10.1364/AO.34.004892.
The far-UV reflectance of thin unoxidized aluminum films prepared and maintained in ultra-highvacuum conditions was measured versus the angle of incidence, and the complex refractive index was obtained from those measurements on several wavelengths from 82.6 to 113.5 nm. Measurements were made on two perpendicular planes of incidence to deal with the unknown of the polarization state of the radiation beam. The surface roughness was characterized by atomic force microscopy. The refractive index is obtained for the first time, to our knowledge, from direct optical measurements in this spectral range. Current results match well the former values in the literature that were calculated through the Kramers-Kronig analysis by using in the above interval reflectances estimated from electron-energy-loss spectra and from optical measurements on surfaces of unstated roughness.
在超高真空条件下制备并保持的未氧化铝薄膜的远紫外反射率,是相对于入射角进行测量的,并且在82.6至113.5 nm的几个波长上通过这些测量获得了复折射率。在两个相互垂直的入射平面上进行测量,以处理辐射束偏振态未知的问题。表面粗糙度通过原子力显微镜进行表征。据我们所知,在该光谱范围内首次通过直接光学测量获得了折射率。当前结果与文献中以前的值非常吻合,以前的值是通过克莱默斯-克勒尼希分析计算得出的,该分析使用了上述区间内从电子能量损失谱估计的反射率以及对未说明粗糙度的表面进行光学测量得到的反射率。