Larruquert J I, Méndez J A, Aznárez J A
Appl Opt. 1996 Oct 1;35(28):5692-7. doi: 10.1364/AO.35.005692.
Measurements of the extreme ultraviolet (EUV) reflectance of unoxidized aluminum films versus the angle of incidence in the interval of 82-77 nm, just below the aluminum plasma wavelength (83 nm), are presented. The continuum of helium was used as a radiation source for the first time in EUV reflectometry, to our knowledge. The surface roughness of substrates and samples was characterized by atomic force microscopy. The complex refractive index of unoxidized aluminum was obtained from reflectance measurements at each wavelength for the first time in this spectral range. Data on the refractive index, the dielectric constant, and the energy loss function in the above interval are shown together with our previous data obtained in an interval of 82.6-113.5 nm. Current results on the refractive index show a good match with the data in the literature calculated through the Kramers-Kronig analysis, the largest differences being in the imaginary part of the refractive index at the shortest wavelengths.
本文给出了在略低于铝等离子体波长(83nm)的82 - 77nm波长区间内,未氧化铝膜的极紫外(EUV)反射率随入射角的测量结果。据我们所知,在EUV反射测量中首次使用氦的连续谱作为辐射源。用原子力显微镜对衬底和样品的表面粗糙度进行了表征。在该光谱范围内首次从每个波长的反射率测量中获得了未氧化铝的复折射率。上述区间内的折射率、介电常数和能量损失函数的数据与我们之前在82.6 - 113.5nm区间内获得的数据一起展示。当前的折射率结果与通过克莱默斯 - 克朗尼格分析计算得到的文献数据匹配良好,最大差异出现在最短波长处折射率的虚部。