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用于衍射光学元件制造的灰度掩膜:II. 空间滤波半色调网屏

Gray-scale masks for diffractive-optics fabrication: II. Spatially filtered halftone screens.

作者信息

O'Shea D C, Rockward W S

出版信息

Appl Opt. 1995 Nov 10;34(32):7518-26. doi: 10.1364/AO.34.007518.

Abstract

Fabrication of diffractive optics with binary masks requires multiple photolithographic processes to produce efficient, continuous profile elements (kinoforms). Alignment or etching errors at any stage of fabrication decrease the efficiency of the element. We developed two accessible procedures that minimize fabrication complexity, component turnaround time, and cost. The first technique [Appl. Opt. 34, 7507-7517 (1995)] uses gray-scale masks produced by commercial slide-imager systems. Here, we report on an alternative technique for producing gray-scale masks by spatial filtering of halftone screens. Using the photoreduced gray-scale patterns as lithographic masks, we fabricated diffractiveoptic blazed gratings and lens arrays in both photoresist and quartz. First-order efficiencies as high as 70% are reported. Also, the strengths and limitations of this technique are compared with the previously reported slide-imager method as well as other fabrication methods.

摘要

使用二元掩模制造衍射光学元件需要多个光刻工艺来生产高效的连续轮廓元件(菲涅耳波带片)。制造过程中任何阶段的对准或蚀刻误差都会降低元件的效率。我们开发了两种可行的方法,可将制造复杂性、元件周转时间和成本降至最低。第一种技术[《应用光学》34, 7507 - 7517(1995)]使用商业幻灯片成像系统制作的灰度掩模。在此,我们报告一种通过对半色调网屏进行空间滤波来制作灰度掩模的替代技术。使用光还原的灰度图案作为光刻掩模,我们在光刻胶和石英中制造了衍射光学闪耀光栅和透镜阵列。据报道,一阶效率高达70%。此外,还将该技术的优缺点与先前报道的幻灯片成像方法以及其他制造方法进行了比较。

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