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高功函数金属纳米点在非晶硅薄膜太阳电池性能中的作用:提供对陷光的欧姆接触。

The role of high work-function metallic nanodots on the performance of a-Si:H solar cells: offering ohmic contact to light trapping.

机构信息

IBM T. J. Watson Research Center, Yorktown Heights, New York 10598, USA.

出版信息

ACS Nano. 2010 Dec 28;4(12):7331-6. doi: 10.1021/nn1023544. Epub 2010 Nov 22.

Abstract

Addition of carbon into p-type "window" layers in hydrogenated amorphous silicon (a-Si:H) solar cells enhances short circuit currents and open circuit voltages by a great deal. However, a-Si:H solar cells with high carbon-doped "window" layers exhibit poor fill factors due to a Schottky barrier-like impedance at the interface between a-SiC:H windows and transparent conducting oxides (TCO), although they show maximized short circuit currents and open circuit voltages. The impedance is caused by an increasing mismatch between the work function of TCO and that of p-type a-SiC:H. Applying ultrathin high-work-function metals at the interface between the two materials results in an effective lowering of the work function mismatch and a consequent ohmic behavior. If the metal layer is sufficiently thin, then it forms nanodots rather than a continuous layer which provides light-scattering effect. We demonstrate 31% efficiency enhancement by using high-work-function materials for engineering the work function at the key interfaces to raise fill factors as well as photocurrents. The use of metallic interface layers in this work is a clear contrast to previous work where attempts were made to enhance the photocurrent using plasmonic metal nanodots on the solar cell surface.

摘要

在氢化非晶硅(a-Si:H)太阳能电池的 p 型“窗口”层中添加碳可大大提高短路电流和开路电压。然而,掺碳高的“窗口”层的 a-Si:H 太阳能电池由于在 a-SiC:H 窗口和透明导电氧化物(TCO)之间的界面处存在肖特基势垒样阻抗,因此填充因子较差,尽管它们表现出最大的短路电流和开路电压。这种阻抗是由 TCO 的功函数与 p 型 a-SiC:H 的功函数之间的不匹配增加引起的。在两种材料之间的界面上施加超薄的高功函数金属会导致有效降低功函数不匹配,从而产生欧姆行为。如果金属层足够薄,它会形成纳米点而不是连续层,从而提供光散射效应。我们通过使用高功函数材料来提高关键界面的功函数,从而提高填充因子和光电流,实现了 31%的效率提高。与之前在太阳能电池表面使用等离子体金属纳米点来提高光电流的尝试相比,本工作中使用金属界面层是一个明显的对比。

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