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介电薄膜中光致折射率变化:弛豫时间和幅度的实验测定

Light-induced refractive-index modifications in dielectric thin films: experimental determination of relaxation time and amplitude.

作者信息

Monneret S, Tisserand S, Flory F, Rigneault H

出版信息

Appl Opt. 1996 Sep 1;35(25):5013-20. doi: 10.1364/AO.35.005013.

Abstract

A two-beam setup based on the totally reflecting prism coupler is shown to be a powerful means of characterizing light-induced refractive-index modifications in dielectric thin films. Rise and relaxation times and amplitudes of thin-film refractive-index variations can be measured. Some developments of the electromagnetic theory of prism coupling are presented for Gaussian incident beams. Measurements made on a single Ta(2)O(5) layer deposited on a silica glass are presented. Relaxation times of a few milliseconds reveal the thermal origin of the phenomena. The thermal nonlinear coefficient of this Ta(2)O(5) layer is nearly 10(-15) m(2)/W.

摘要

基于全反射棱镜耦合器的双光束装置被证明是表征介电薄膜中光致折射率变化的有力手段。可以测量薄膜折射率变化的上升时间、弛豫时间和幅度。针对高斯入射光束,介绍了棱镜耦合电磁理论的一些进展。给出了在石英玻璃上沉积的单个Ta(2)O(5)层的测量结果。几毫秒的弛豫时间揭示了该现象的热起源。该Ta(2)O(5)层的热非线性系数约为10(-15) m(2)/W。

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