Department of Physics, University of Alabama at Birmingham, 310 Campbell Hall, Birmingham, AL 35294-1170, USA.
J Mater Sci Mater Med. 2011 Feb;22(2):307-16. doi: 10.1007/s10856-010-4207-1. Epub 2011 Jan 8.
While interfacial graphite formation and subsequent poor film adhesion is commonly reported for chemical vapor deposited hard carbon films on cobalt-based materials, we find the presence of O(2) in the feedgas mixture to be useful in achieving adhesion on a CoCrMo alloy. Nucleation studies of surface structure before formation of fully coalesced hard carbon films reveal that O(2) feedgas helps mask the catalytic effect of cobalt with carbon through early formation of chromium oxides and carbides. The chromium oxides, in particular, act as a diffusion barrier to cobalt, minimizing its migration to the surface where it would otherwise interact deleteriously with carbon to form graphite. When O(2) is not used, graphitic soot forms and films delaminate readily upon cooling to room temperature. Continuous 1 μm-thick nanostructured carbon films grown with O(2) remain adhered with measured hardness of 60 GPa and show stable, non-catastrophic circumferential micro-cracks near the edges of indent craters made using Rockwell indentation.
虽然在化学气相沉积的硬碳膜在钴基材料上通常会形成界面石墨并随后导致较差的薄膜附着力,但我们发现将 O(2) 引入到原料气混合物中对于在 CoCrMo 合金上实现附着力是有用的。在完全聚合的硬碳膜形成之前,对表面结构的成核研究表明,O(2)原料气有助于通过早期形成铬的氧化物和碳化物来掩盖钴对碳的催化作用。特别是,铬的氧化物起到了钴的扩散阻挡层的作用,最大程度地减少了钴向表面的迁移,否则钴会与碳相互作用形成石墨,从而产生有害影响。当不使用 O(2)时,会形成石墨状烟尘,并且在冷却至室温时薄膜容易分层。使用 O(2) 生长的连续 1μm 厚的纳米结构碳膜仍然附着,其硬度测量值为 60GPa,并显示出在使用洛氏压痕进行压痕时压痕坑边缘附近稳定、非灾难性的周向微裂纹。