Max-Planck-Institut für Quantenoptik, 85740 Garching, Germany.
J Xray Sci Technol. 1993 Jan 1;4(1):8-17. doi: 10.3233/XST-1993-4102.
We describe a XUV spectrometer for the study of dense hot microplasmas at wavelengths between ≈50 and ≈300 Å. It uses a commercially fabricated grazing incidence flat-field reflection grating with 1200 grooves per millimeter. The spectral resolution was optimized by imaging the source on a narrow slit with the help of a curved grazing incidence mirror. The instrument was tested with a laser-produced plasma as a source. The limit of the resolving power due to imaging aberrations of the flat-field grating ranges from 1500 at 50 Å to 3600 at 200 Å and has been achieved with a 5-μm slit. We also measured and calculated the grating efficiencies for the first to fifth diffraction order as a function of wavelength.
我们描述了一种用于研究波长在 ≈50 至 ≈300 Å 之间的密集热微等离子体的 XUV 光谱仪。它使用了一个商业制造的掠入射平面场反射光栅，每毫米有 1200 个刻槽。通过使用弯曲的掠入射反射镜将源成像到一个狭窄的狭缝上，优化了光谱分辨率。该仪器使用激光产生的等离子体作为光源进行了测试。由于平面场光栅的像差，分辨率的极限范围从 50 Å 时的 1500 到 200 Å 时的 3600，并且已经使用 5 μm 的狭缝实现了。我们还测量并计算了第一到第五衍射级的光栅效率作为波长的函数。
