Max-Planck-Institut für Mikrostrukturphysik, Weinberg 2, 06120 Halle, Germany.
Chemphyschem. 2011 Mar 14;12(4):791-8. doi: 10.1002/cphc.201000923. Epub 2011 Feb 21.
Atomic layer deposition (ALD) is a subset of chemical vapor deposition (CVD) and both use very similar chemistry. Recently, it has been reported that ALD has the potential to realize a new design paradigm of bioinorganic materials through metal infiltration, which in nature has been employed as a hardening strategy for many tissues in diverse biological organisms. Herein, using a spider dragline silk and a collagen membrane as targets, we have performed a comparative study to elucidate the difference of the metal infiltration effect by ALD and CVD. From the comparison of mechanical properties, concentration of the infiltrated metal, and structural changes induced by the infiltrated metal, it has been proven that the metal can effectively infiltrate biomaterials by ALD and the infiltrated metal leads to highly improved mechanical properties accompanied by substantial changes in the protein structures, whereas CVD is less effective.
原子层沉积（ALD）是化学气相沉积（CVD）的一个子集，两者都使用非常相似的化学物质。最近，据报道，ALD 有可能通过金属渗透实现生物无机材料的新设计范例，而在自然界中，金属渗透已被用作许多不同生物组织的多种组织的硬化策略。在这里，我们使用蜘蛛拖丝和胶原蛋白膜作为目标，进行了一项比较研究，以阐明 ALD 和 CVD 的金属渗透效果的差异。通过对机械性能、渗透金属的浓度以及渗透金属引起的结构变化的比较，证明 ALD 可以有效地将金属渗透到生物材料中，并且渗透的金属会导致机械性能的显著提高，同时蛋白质结构也会发生很大的变化，而 CVD 的效果则较差。
