Nano Fabrication Group, Material and Device Center, Samsung Electronics, San 14-1, Nongseo-Dong, Giheung-Gu, Yongin-City, Gyeonggi-Do 446-712, Korea.
Nanotechnology. 2011 Apr 1;22(13):135301. doi: 10.1088/0957-4484/22/13/135301. Epub 2011 Feb 22.
A novel fabrication method for a two-dimensional photonic crystal color filter based on guided mode resonance is proposed. An amorphous silicon layer deposited through the low-temperature plasma enhanced chemical vapor deposition (PECVD) process is patterned into two-dimensional structures using low-cost nanoimprint lithography. It is then effectively crystallized using multi-shot excimer laser annealing at low energy. We have demonstrated analytically and experimentally that single crystal-like silicon patterns on a glass substrate can offer high-efficiency photonic crystal color filters for reflective display applications. The highly crystallized silicon patterning scheme presented here may be very attractive for a variety of devices requiring high carrier mobility and high optical efficiency.
提出了一种基于导模共振的二维光子晶体滤光片的新颖制造方法。通过低温等离子体增强化学气相沉积（PECVD）工艺沉积的非晶硅层使用低成本的纳米压印光刻技术被图案化成二维结构。然后，使用多脉冲准分子激光退火在低能量下有效地进行结晶。我们已经通过分析和实验证明，玻璃衬底上的单晶状硅图案可以为反射式显示应用提供高效的光子晶体滤光片。这里提出的高度结晶硅图案化方案对于需要高载流子迁移率和高光学效率的各种器件可能非常有吸引力。
