Kreuzer Martin, Kaltofen Thomas, Steitz Roland, Zehnder Beat H, Dahint Reiner
Angewandte Physikalische Chemie, Universität Heidelberg, Heidelberg, Germany.
Rev Sci Instrum. 2011 Feb;82(2):023902. doi: 10.1063/1.3505797.
We describe an apparatus for measuring scattering length density and structure of molecular layers at planar solid-liquid interfaces under high hydrostatic pressure conditions. The device is designed for in situ characterizations utilizing neutron reflectometry in the pressure range 0.1-100 MPa at temperatures between 5 and 60 °C. The pressure cell is constructed such that stratified molecular layers on crystalline substrates of silicon, quartz, or sapphire with a surface area of 28 cm(2) can be investigated against noncorrosive liquid phases. The large substrate surface area enables reflectivity to be measured down to 10(-5) (without background correction) and thus facilitates determination of the scattering length density profile across the interface as a function of applied load. Our current interest is on the stability of oligolamellar lipid coatings on silicon surfaces against aqueous phases as a function of applied hydrostatic pressure and temperature but the device can also be employed to probe the structure of any other solid-liquid interface.
我们描述了一种用于在高静水压力条件下测量平面固液界面处分子层的散射长度密度和结构的装置。该装置设计用于原位表征，利用中子反射测量法，压力范围为0.1 - 100 MPa，温度范围为5至60°C。压力池的构造使得可以研究硅、石英或蓝宝石等晶体基底上表面积为28 cm²的分层分子层与非腐蚀性液相的相互作用。大的基底表面积使得能够测量低至10⁻⁵的反射率（无背景校正），从而便于确定作为施加负载函数的跨界面散射长度密度分布。我们目前感兴趣的是硅表面上的寡层脂质涂层在水相中的稳定性与施加的静水压力和温度的关系，但该装置也可用于探测任何其他固液界面的结构。
