Department of Electrical and Computer Engineering, and Center for Nanoscale Science and Engineering, University of Kentucky, Lexington, KY 40506, USA.
Nanoscale. 2011 Jul;3(7):2709-17. doi: 10.1039/c1nr10026b. Epub 2011 Mar 3.
Focused electron-beam-induced deposition using bulk liquid precursors (LP-EBID) is a new nanofabrication technique developed in the last two years as an alternative to conventional EBID, which utilizes cumbersome gaseous precursors. Furthermore, LP-EBID using dilute aqueous precursors has been demonstrated to yield platinum (Pt) nanostructures with as-deposited metal content that is substantially higher than the purity achieved by EBID with currently available gaseous precursors. This advantage of LP-EBID--along with the ease of use, low cost, and relative innocuousness of the liquid precursors--holds promise for its practical applicability in areas such as rapid device prototyping and lithographic mask repair. One of the feasibility benchmarks for the LP-EBID method is the ability to deposit high-fidelity nanostructures on various substrate materials. In this study, we report the first observations of performing LP-EBID on bare and metal-coated silicon-nitride membranes, and compare the resulting Pt deposits to those obtained by LP-EBID on polyimide membranes in terms of nucleation, morphology, size dependence on electron dose, and purity.
使用体相液体前体的聚焦电子束诱导沉积（LP-EBID）是过去两年中开发的一种新的纳米制造技术，作为传统 EBID 的替代方法，传统 EBID 利用繁琐的气态前体。此外，已经证明使用稀水溶液前体的 LP-EBID 可以生成具有沉积后金属含量大大高于当前可用气态前体实现的纯度的铂（Pt）纳米结构。LP-EBID 的这一优势——以及液体前体的易用性、低成本和相对无害性——有望使其在快速器件原型制作和光刻掩模修复等领域得到实际应用。LP-EBID 方法的可行性基准之一是在各种衬底材料上沉积高保真度纳米结构的能力。在这项研究中，我们报告了首次在裸硅氮化物膜和金属涂层硅氮化物膜上进行 LP-EBID 的观察结果，并根据成核、形态、电子剂量依赖性和纯度，将得到的 Pt 沉积物与 LP-EBID 在聚酰亚胺膜上得到的沉积物进行了比较。
