Department of Physics, Pennsylvania State University, University Park, PA 16802, USA.
J Phys Condens Matter. 2010 Aug 25;22(33):334213. doi: 10.1088/0953-8984/22/33/334213. Epub 2010 Aug 4.
Here we report a new approach for producing clean and homogeneous boron-doped single-walled carbon nanotubes. This approach combines the homogeneous dispersion of B(n)O(m)(+) ionic molecules over the nanotube surfaces in a liquid solution, with a high temperature chemical reaction that incorporates the boron atoms into the sp(2) carbon network of the nanotube wall. A comparative study of sheet resistance versus optical transmission in nanotube network films with and without boron-doping is also presented. Although electron energy loss spectroscopy revealed very low B-doping levels (<1 at.%), the dc conductivity of doped samples was raised by a factor of 3.4. Changes in the free carrier contribution to the optical conductivity of single-walled carbon nanotube (SWCNT) films induced by boron-doping was also studied via optical transmission in the far-infrared (IR) (50-7000 cm(-1)). A Drude model was fitted to the changes in the far-IR conductivity to quantify the additional free carrier concentration induced by the B-doping.
在这里,我们报告了一种生产清洁、均匀的硼掺杂单壁碳纳米管的新方法。该方法将 B(n)O(m)(+)离子分子在液体溶液中均匀分散在纳米管表面,与高温化学反应相结合,将硼原子掺入纳米管壁的 sp(2)碳网络中。我们还对有无硼掺杂的纳米管网络薄膜的电阻与光透射率进行了对比研究。尽管电子能量损失光谱显示硼掺杂水平非常低(<1 原子%),但掺杂样品的直流电导率提高了 3.4 倍。通过远红外(IR)(50-7000 cm(-1))光透射研究,研究了硼掺杂对单壁碳纳米管(SWCNT)薄膜光导率中自由载流子贡献的变化。用 Drude 模型拟合远红外电导率的变化,以量化硼掺杂引起的额外自由载流子浓度。