Hwang J Y, Park J S, Yim H I, Kim T W, Shin D Y, Lee S B
Department of Electronics Engineering and Institute of Nano Science and Technology, Hanyang University, Seoul 133-791, Korea.
J Nanosci Nanotechnol. 2011 Jan;11(1):856-9. doi: 10.1166/jnn.2011.3236.
Magnetic anisotropy properties of amorphous ferromagnetic CoSiB/Pt multilayers with perpendicular magnetic anisotropy (PMA, K(u)) were systematically investigated as a function of CoSiB layer thickness (t(coSiB)) and Pt layer thickness (t(Pt)). In two series of [CoSiB t(coSiB)Pt t(P1)]5 multilayers, the perpendicular coercivity (H(c)) increased to reach a maximum and then decreased with further increase in both t(coSiB) and t(Pt), due to intermixing of CoSiB/Pt interfaces. Particularly, using the amorphous soft magnetic CoSiB, the coercivity became very sensitive to the CoSiB thickness. These multilayer films exhibited a high K(u) of 2 x 10(6) erg/cc and a high H(c) of 360 Oe with marked squareness. It was found that even after annealing at 350 degrees C, the CoSiB/Pt multilayers had a high PMA and their H(c) increased.
对具有垂直磁各向异性（PMA，K(u)）的非晶铁磁CoSiB/Pt多层膜的磁各向异性特性作为CoSiB层厚度（t(coSiB)）和Pt层厚度（t(Pt)）的函数进行了系统研究。在两组[CoSiB t(coSiB)Pt t(P1)]5多层膜中，由于CoSiB/Pt界面的混合，垂直矫顽力（H(c)）先增大到最大值，然后随着t(coSiB)和t(Pt)的进一步增加而减小。特别是，使用非晶软磁CoSiB时矫顽力对CoSiB厚度变得非常敏感。这些多层膜表现出2×10(6) erg/cc的高K(u)和360 Oe的高H(c)，具有明显的矩形度。发现即使在350℃退火后，CoSiB/Pt多层膜仍具有高PMA且其H(c)增加。
