Institut des Sciences Moléculaires (UMR 5255-CNRS), Université Bordeaux 1, 351 Cours de la Libération, 33405 Talence, France.
Langmuir. 2011 May 17;27(10):6076-84. doi: 10.1021/la2006293. Epub 2011 Apr 12.
Polarization modulation infrared reflection absorption spectroscopy (PM-IRRAS) was used to characterize self-assembled monolayers (SAMs). Novel ester-terminated organosilicon coupling agents possessing a trialkoxysilyl headgroup and a urea group in the linear alkyl chains (4) were synthesized and grafted onto SiO(2)/Au substrates (SiO(2) film of 200 Å thickness deposited on gold mirror). This composite substrate allowed the anchoring of SAMs and preserved the high reflectivity for infrared radiation. PM-IRRAS spectra with very high signal-to-noise ratios have been obtained in the mid-infrared spectral range allowing monitoring of the grafted SAMs. Quantitative analysis of the measured signal is described to compare PM-IRRAS and conventional IRRAS spectra. This quantitative analysis has been validated since the band intensities in the corrected PM-IRRAS and conventional IRRAS spectra are identical. Orientation information on the different functional groups has been obtained comparing the corrected PM-IRRAS spectrum with the one calculated using isotropic optical constants of ester-terminated organosilicon coupling agents 4. The carbonyls of the urea groups are preferentially parallel to the substrate surface favoring intermolecular hydrogen bonding and consequently a close packing of the molecules attached to the surface. By contrast, the alkyl chains present gauche defects and are poorly oriented.
偏振调制红外反射吸收光谱(PM-IRRAS)被用于对自组装单分子层(SAMs)进行特征化。新型酯基末端有机硅偶联剂具有三烷氧基硅基头基团和线性烷基链中的脲基(4),被合成并接枝到 SiO2/Au 基底(厚度为 200Å 的 SiO2 薄膜沉积在金镜上)上。这种复合基底允许 SAMs 的固定,并保持对红外辐射的高反射率。在中红外光谱范围内获得了具有非常高信噪比的 PM-IRRAS 光谱,允许监测接枝的 SAMs。描述了对测量信号的定量分析,以比较 PM-IRRAS 和常规 IRRAS 光谱。由于校正后的 PM-IRRAS 和常规 IRRAS 光谱中的带强度相同,因此该定量分析得到了验证。通过比较校正后的 PM-IRRAS 光谱与使用酯基末端有机硅偶联剂 4 的各向同性光学常数计算得到的光谱,获得了关于不同官能团的取向信息。脲基的羰基优先与基底表面平行,有利于分子间氢键形成,从而使附着在表面上的分子紧密堆积。相比之下,烷基链存在 gauche 缺陷且取向不佳。