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自催化 GaN 纳米线的形态和分子束外延法形成它们的时间顺序。

Morphology of self-catalyzed GaN nanowires and chronology of their formation by molecular beam epitaxy.

机构信息

CNRS-Laboratoire de Photonique et de Nanostructures, Marcoussis, France.

出版信息

Nanotechnology. 2011 Jun 17;22(24):245606. doi: 10.1088/0957-4484/22/24/245606. Epub 2011 Apr 21.

Abstract

GaN nanowires are synthesized by plasma-assisted molecular beam epitaxy on Si(111) substrates. The strong impact of the cell orientation relative to the substrate on the nanowire morphology is shown. To study the kinetics of growth, thin AlN markers are introduced periodically during NW growth. These markers are observed in single nanowires by transmission electron microscopy, giving access to the chronology of the nanowire formation and to the time evolution of the nanowire morphology. A long delay precedes the beginning of nanowire formation. Then, their elongation proceeds at a constant rate. Later, shells develop on the side-wall facets by ascending growth of layer bunches which first agglomerate at the nanowire foot.

摘要

GaN 纳米线是通过等离子体辅助分子束外延在 Si(111)衬底上合成的。实验结果表明,相对于衬底,细胞取向对纳米线形态的影响很大。为了研究生长动力学,在 NW 生长过程中周期性地引入薄的 AlN 标记物。通过透射电子显微镜观察这些标记物,可以获得纳米线形成的时间顺序以及纳米线形态的时间演化。在纳米线形成之前,有一个很长的延迟。然后,它们以恒定的速率伸长。之后,在纳米线底部首先团聚的层束的上升生长过程中,在侧壁面形成壳。

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