Department of Radiation Medicine, Radiation Research Laboratories, Loma Linda University Medical Center, Loma Linda, California 92354, USA.
Radiat Res. 2011 Aug;176(2):187-97. doi: 10.1667/rr2493.1. Epub 2011 May 16.
Changes in the expression of genes implicated in oxidative stress and in extracellular matrix (ECM) remodeling and selected protein expression profiles in mouse skin were examined after exposure to low-dose-rate or high-dose-rate photon irradiation. ICR mice received whole-body γ rays to total doses of 0, 0.25, 0.5 and 1 Gy at dose rates of 50 cGy/h or 50 cGy/min. Skin tissues were harvested for characterization at 4 h after irradiation. For oxidative stress after low-dose-rate exposure, 0.25, 0.5 and 1 Gy significantly altered 27, 23 and 25 genes, respectively, among 84 genes assessed (P < 0.05). At doses as low as 0.25 Gy, many genes responsible for regulating the production of reactive oxygen species (ROS) were significantly altered, with changes >2-fold compared to 0 Gy. For an ECM profile, 18-20 out of 84 genes were significantly up- or downregulated after low-dose-rate exposure. After high-dose-rate irradiation, of 84 genes associated with oxidative stress, 16, 22 and 22 genes were significantly affected after 0.25, 0.5 and 1 Gy, respectively. Compared to low-dose-rate radiation, high-dose-rate exposure resulted in different ECM gene expression profiles. The most striking changes after low-dose-rate or high-dose-rate exposure on ECM profiles were on genes encoding matrix metalloproteinases (MMPs), e.g., Mmp2 and Mmp15 for low dose rate and Mmp9 and Mmp11 for high dose rate. Immunostaining for MMP-2 and MMP-9 proteins showed radiation dose rate-dependent differences. These data revealed that exposure to low total doses with low-dose-rate or high-dose-rate photon radiation induced oxidative stress and ECM-associated alterations in gene expression profiles. The expression of many genes was differentially regulated by different total dose and/or dose-rate regimens.
在接受低剂量率或高剂量率光子照射后,研究了小鼠皮肤中氧化应激和细胞外基质(ECM)重塑相关基因表达的变化以及选定的蛋白质表达谱。ICR 小鼠接受全身γ射线照射,总剂量为 0、0.25、0.5 和 1 Gy,剂量率分别为 50 cGy/h 或 50 cGy/min。照射后 4 小时采集皮肤组织进行特征描述。对于低剂量率暴露后的氧化应激,在评估的 84 个基因中,0.25、0.5 和 1 Gy 分别显著改变了 27、23 和 25 个基因(P<0.05)。在低剂量率暴露下,即使剂量低至 0.25 Gy,许多负责调节活性氧(ROS)产生的基因也发生了显著改变,与 0 Gy 相比变化超过 2 倍。对于 ECM 谱,在低剂量率暴露后,84 个基因中有 18-20 个被显著上调或下调。在高剂量率照射后,与氧化应激相关的 84 个基因中,0.25、0.5 和 1 Gy 后分别有 16、22 和 22 个基因受到显著影响。与低剂量率辐射相比,高剂量率暴露导致 ECM 基因表达谱不同。在 ECM 谱中,低剂量率或高剂量率暴露后最显著的变化是编码基质金属蛋白酶(MMPs)的基因,例如低剂量率时的 Mmp2 和 Mmp15,高剂量率时的 Mmp9 和 Mmp11。MMP-2 和 MMP-9 蛋白的免疫染色显示出辐射剂量率依赖性差异。这些数据表明,低总剂量的低剂量率或高剂量率光子辐射会引起氧化应激和 ECM 相关基因表达谱的改变。许多基因的表达受到不同总剂量和/或剂量率方案的差异调节。