Gallego S, Márquez A, Ortuño M, Francés J, Marini S, Beléndez A, Pascual I
Departamento de Física, Ingeniería de Sistemas y Teoría de la Señal, Universidad de Alicante, Apartado 99, E-03080 Alicante, Spain.
Opt Express. 2011 May 23;19(11):10896-906. doi: 10.1364/OE.19.010896.
Relief surface changes provide interesting possibilities for storing diffractive optical elements on photopolymers and are an important source of information to characterize and understand the material behaviour. In this paper we present a 3-dimensional model based on direct measurements of parameters to predict the relief structures generated on the material. This model is successfully applied to different photopolymers with different values of monomer diffusion. The importance of monomer diffusion in depth is also discussed.
浮雕表面变化为在光聚合物上存储衍射光学元件提供了有趣的可能性，并且是表征和理解材料行为的重要信息来源。在本文中，我们提出了一个基于参数直接测量的三维模型，以预测材料上产生的浮雕结构。该模型已成功应用于具有不同单体扩散值的不同光聚合物。还讨论了单体深度扩散的重要性。
