Abdelouahdi K, Sant C, Miserque F, Aubert P, Zheng Y, Legrand-Buscema C, Perrière J
Laboratoire d'Etude des Milieux Nanométriques, Bâtiment Maupertuis 1, rue du Père Jarlan, 91025 Evry cedex, France.
J Phys Condens Matter. 2006 Feb 15;18(6):1913-25. doi: 10.1088/0953-8984/18/6/008. Epub 2006 Jan 24.
Tungsten carbide thin films have been prepared by reactive rf sputtering from a tungsten target in various Ar-CH(4) mixtures. The composition, structure, microstructure and chemical state of the films have been investigated by the complementary use of RBS, NRA, XRD, GIXRD, TEM and XPS analyses. These characteristics of the films were then correlated to their mechanical properties determined by hardness (H), Young's modulus (E(r)) and friction coefficient measurements. Under low CH(4) pressures, the formation of a mixture of nanocrystalline WC(1-x) and W(2)C phases has been observed. A pure WC(1-x) phase was observed in films having a composition close to W(1)C(0.9). With increasing CH(4) pressure, the amount of carbon in the films increases, leading to a progressive amorphization of tungsten carbide deposited layers. Nanocomposite films appeared to be formed, with WC(1-x) nanograins (<3 nm) dispersed in an amorphous carbon matrix. The film deposited at 30% of CH(4) exhibits a-C:H phase. The nature of the phases present in the films plays an important role on their mechanical properties, as shown by the wide domain of variation of the films' hardness (between 22 and 5.5 GPa) and the plastic deformation parameter H(3)/E(r)(2) (between 0.08 and 0.04).
通过在各种氩 - 甲烷混合气体中利用反应射频溅射从钨靶制备了碳化钨薄膜。通过互补使用卢瑟福背散射（RBS）、核反应分析（NRA）、X射线衍射（XRD）、掠入射X射线衍射（GIXRD）、透射电子显微镜（TEM）和X射线光电子能谱（XPS）分析研究了薄膜的成分、结构、微观结构和化学状态。然后将这些薄膜的特性与其通过硬度（H）、杨氏模量（E(r)）和摩擦系数测量确定的力学性能相关联。在低甲烷压力下，观察到形成了纳米晶WC(1 - x)和W(2)C相的混合物。在成分接近W(1)C(0.9)的薄膜中观察到纯WC(1 - x)相。随着甲烷压力的增加，薄膜中的碳含量增加，导致沉积的碳化钨层逐渐非晶化。似乎形成了纳米复合薄膜，其中WC(1 - x)纳米颗粒（<3纳米）分散在非晶碳基质中。在30%甲烷含量下沉积的薄膜呈现a - C:H相。薄膜中存在的相的性质对其力学性能起着重要作用，如薄膜硬度（在22至5.5吉帕之间）和塑性变形参数H(3)/E(r)(2)（在0.08至0.04之间）的广泛变化所示。
