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铕离子注入和退火对氮化镓量子点激子复合的影响。

Effect of Eu-implantation and annealing on the GaN quantum dots excitonic recombination.

作者信息

Peres Marco, Magalhães Sérgio, Fellmann Vincent, Daudin Bruno, Neves Armando José, Alves Eduardo, Lorenz Katharina, Monteiro Teresa

机构信息

Departamento de Física e I3N, Universidade de Aveiro, Campus de Santiago, Aveiro, 3810-193, Portugal.

出版信息

Nanoscale Res Lett. 2011 May 9;6(1):378. doi: 10.1186/1556-276X-6-378.

DOI:10.1186/1556-276X-6-378
PMID:21711897
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC3211471/
Abstract

Undoped self-assembled GaN quantum dots (QD) stacked in superlattices (SL) with AlN spacer layers were submitted to thermal annealing treatments. Changes in the balance between the quantum confinement, strain state of the stacked heterostructures and quantum confined Stark effect lead to the observation of GaN QD excitonic recombination above and below the bulk GaN bandgap. In Eu-implanted SL structures, the GaN QD recombination was found to be dependent on the implantation fluence. For samples implanted with high fluence, a broad emission band at 2.7 eV was tentatively assigned to the emission of large blurred GaN QD present in the damage region of the implanted SL. This emission band is absent in the SL structures implanted with lower fluence and hence lower defect level. In both cases, high energy emission bands at approx. 3.9 eV suggest the presence of smaller dots for which the photoluminescence intensity was seen to be constant with increasing temperatures. Despite the fact that different deexcitation processes occur in undoped and Eu-implanted SL structures, the excitation population mechanisms were seen to be sample-independent. Two main absorption bands with maxima at approx. 4.1 and 4.7 to 4.9 eV are responsible for the population of the optically active centres in the SL samples.

摘要

将未掺杂的自组装氮化镓量子点(QD)与氮化铝间隔层堆叠成超晶格(SL),并对其进行热退火处理。量子限制、堆叠异质结构的应变状态和量子限制斯塔克效应之间平衡的变化,导致在体氮化镓带隙之上和之下观察到氮化镓量子点的激子复合。在铕注入的超晶格结构中,发现氮化镓量子点的复合取决于注入剂量。对于高剂量注入的样品,在2.7电子伏特处的一个宽发射带初步被归因于存在于注入超晶格损伤区域中的大的模糊氮化镓量子点的发射。在低剂量注入因而缺陷水平较低的超晶格结构中不存在这个发射带。在这两种情况下,大约3.9电子伏特处的高能发射带表明存在较小的量子点,其光致发光强度随温度升高而保持恒定。尽管在未掺杂和铕注入的超晶格结构中发生不同的去激发过程,但激发粒子数机制与样品无关。在超晶格样品中,两个主要吸收带的最大值分别在大约4.1以及4.7至4.9电子伏特处,它们负责光活性中心的粒子数。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/fa61/3211471/3caa10d8f5b4/1556-276X-6-378-3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/fa61/3211471/1214b6b8ea85/1556-276X-6-378-1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/fa61/3211471/ccbc10105176/1556-276X-6-378-2.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/fa61/3211471/3caa10d8f5b4/1556-276X-6-378-3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/fa61/3211471/1214b6b8ea85/1556-276X-6-378-1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/fa61/3211471/ccbc10105176/1556-276X-6-378-2.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/fa61/3211471/3caa10d8f5b4/1556-276X-6-378-3.jpg

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