Suppr超能文献

热退火对聚(3-己基噻吩)-PCBM 共混物纳米形貌的影响。

Effects of thermal annealing upon the nanomorphology of poly(3-hexylselenophene)-PCBM blends.

机构信息

School of Physics and Astronomy, Cardiff University, The Parade, UK.

出版信息

Macromol Rapid Commun. 2011 Sep 15;32(18):1454-60. doi: 10.1002/marc.201100330. Epub 2011 Jul 7.

Abstract

Grazing incidence X-ray diffraction (GI-XRD) is used to characterize the crystallographic dynamics of low molecular weight (LMW) and high molecular weight (HMW) poly(3-hexylselenophene) (P3HS) films and blend films of P3HS with [6-6-]-phenyl-C(61) -butyric acid methyl ester (PCBM) as a function of 'step-by-step' thermal annealing, from room temperature to 250 °C. The temperature-dependent GIXRD data show how the melting point of P3HS crystallites is decreased by the presence of PCBM. P3HS crystallite domain sizes dramatically increase upon annealing to the P3HS melting temperature. The formation of well-oriented HMW P3HS crystallites with the (100) plane parallel to the substrate (edge-on orientation), when cooled from melt, are observed. We compare the behaviour of P3HS pure and blend films with that of poly(3-hexyl)thiophene (P3HT) pure and PCBM blended films and suggest that the similar temperature dependent behaviour we observe may be a common to polythiophene and related polymers and their blends.

摘要

掠入射 X 射线衍射(GI-XRD)用于表征低分子量(LMW)和高分子量(HMW)聚(3-己基噻吩)(P3HS)薄膜和 P3HS 与 [6-6-]-苯基-C(61)-丁酸甲酯(PCBM)的共混膜的晶体动力学作为“逐步”热退火的函数,从室温到 250°C。温度相关的 GIXRD 数据表明 PCBM 的存在如何降低 P3HS 微晶的熔点。在退火到 P3HS 熔融温度时,P3HS 微晶畴尺寸急剧增大。观察到从熔体冷却时,(100)平面平行于衬底的取向良好的 HMW P3HS 微晶的形成(边缘取向)。我们将 P3HS 纯膜和共混膜与 P3HT 纯膜和 PCBM 共混膜的行为进行比较,并提出我们观察到的类似的温度依赖性行为可能是聚噻吩和相关聚合物及其共混物的共同特征。

文献AI研究员

20分钟写一篇综述,助力文献阅读效率提升50倍。

立即体验

用中文搜PubMed

大模型驱动的PubMed中文搜索引擎

马上搜索

文档翻译

学术文献翻译模型,支持多种主流文档格式。

立即体验