Arun Anupama, Salet Paul, Ionescu Adrian M
ELB 335, Station 11, Nanolab, EPFL, Lausanne 1015, Switzerland.
J Nanosci Nanotechnol. 2011 Jun;11(6):4919-22. doi: 10.1166/jnn.2011.4116.
The crossed junction formed between a multi walled carbon nanotube (MWCNT) and a bundle of single walled carbon nanotube (SWCNT) is investigated. The junction is fabricated by orthogonally assembling the MWCNT and SWCNT by a two-step dielectrophoresis process. The conventional dielectrophoresis method to self-assemble carbon nanotubes has been modified to be able to align single MWCNT and SWCNT at predefined location on a substrate. At room temperature, the junction has an ohmic behavior with junction resistance of about 500 KOmega or a conductance of 0.05 (e2/h). At 77 K, the onset of a Schottky-like behavior was observed. The resulting junction has an extremely tiny area of less than 20 nm2 and yet supports a current density of 10(7) A/cm2 at 1 V. The proposed fabrication technique is a convenient way to fabricate novel prototype devices to investigate material properties and new device architecture. Following further optimization, this cross-junction can be an interesting candidate for cross-bar like interconnects, with potential applications in dense logic and memory circuits.
研究了多壁碳纳米管(MWCNT)与单壁碳纳米管束(SWCNT)之间形成的交叉结。该结是通过两步介电泳过程正交组装MWCNT和SWCNT制成的。传统的用于自组装碳纳米管的介电泳方法已被改进,能够在基板上的预定义位置对齐单个MWCNT和SWCNT。在室温下,该结具有欧姆行为,结电阻约为500千欧或电导为0.05(e2/h)。在77 K时,观察到类似肖特基行为的起始。所得结的面积极小,小于20 nm2,但在1 V时仍支持10(7) A/cm2的电流密度。所提出的制造技术是制造新型原型器件以研究材料特性和新器件架构的便捷方法。经过进一步优化,这种交叉结可能是类似交叉开关互连的有趣候选者,在密集逻辑和存储电路中有潜在应用。