Cho S J, Jung D, Boo J H
Department of Chemistry and Institute of Basic Science, Sungkyunkwan University, Suwon 440-746, Korea.
J Nanosci Nanotechnol. 2011 Jun;11(6):5323-7. doi: 10.1166/jnn.2011.3792.
Organic-inorganic hybrid co-polymer thin films were deposited on silicon(100) substrates under the several ratio of TEOS (tetraethoxysilane) against toluene by plasma enhanced chemical vapour deposition (PECVD) method. Toluene and TEOS were utilized as organic and inorganic precursors each, and hydrogen and argon were also used as a bubbler and carrier gases, respectively. In order to compare the difference of the electrical and the mechanical properties of the plasma polymerized thin films, we grew the hybrid co-polymer thin films under the conditions of various ratio between toluene and TEOS with fixed RF (radio frequency using 13.56 MHz) powers at 30 W. The as-grown polymerized thin films were in first analyzed by FT-IR and XPS. The result of FT-IR showed that the co-polymer thin films were polymerized with fragmented each precursor. Also, XPS results showed the chemical species and binding energies of each species. Si 2p core-level spectra from the hybrid polymer thin film showed the status of Si oxidation number. Impedance analyzer was utilized for the measurements of I-V curves and capacitance values. Also, the thin films were analyzed for hardness and Young's modulus by nano-indenter.
通过等离子体增强化学气相沉积（PECVD）方法，在几种TEOS（四乙氧基硅烷）与甲苯的比例下，将有机-无机杂化共聚物薄膜沉积在硅（100）衬底上。甲苯和TEOS分别用作有机和无机前驱体，氢气和氩气也分别用作鼓泡器气体和载气。为了比较等离子体聚合薄膜的电学和力学性能差异，我们在甲苯和TEOS的各种比例条件下，以固定的射频（使用13.56 MHz）功率30 W生长杂化共聚物薄膜。首先通过傅里叶变换红外光谱（FT-IR）和X射线光电子能谱（XPS）对生长的聚合薄膜进行分析。FT-IR结果表明，共聚物薄膜是由每个前驱体碎片化聚合而成的。此外，XPS结果显示了每种物质的化学种类和结合能。杂化聚合物薄膜的Si 2p芯能级光谱显示了Si氧化数的状态。使用阻抗分析仪测量I-V曲线和电容值。此外，通过纳米压痕仪对薄膜的硬度和杨氏模量进行分析。
