Choi Dong-Sik, Lee Jin-Ho, Jung Hee-Soo, Jung Gun-Young, Choi Jae-Hak, Choi Jeong-Woo, Oh Byung-Keun
Interdisciplinary Program of Integrated Biotechnology, Sogang University, #1 Shinsu-Dong, Mapo-Gu, Seoul 121-742, Korea.
J Nanosci Nanotechnol. 2011 May;11(5):4517-21. doi: 10.1166/jnn.2011.3634.
Ultraviolet nanoimprint lithography (UV-NIL) is a high volume and cost-effective patterning technique with sub-10 nm resolution. It has great potential as a candidate for next generation lithography. Using UV-NIL, nanowire patterns were successfully fabricated on a four-inch silicon-on-insulator (SOI) wafer under moderate conditions. The fabricated nanowire patterns were characterized by FE-SEM. Its electrical properties were confirmed by semiconductor parameter analysis. Monoclonal antibodies against beta-amyloid (1-42) were immobilized on the silicon nanowire using a chemical linker. Using this fabricated silicon nanowire device, beta-amyloid (1-42) levels of 1 pM to 100 nM were successfully determined from conductance versus time characteristics. Consequently, the nanopatterned SOI nanowire device can be applied to bioplatforms for the detection of proteins.
紫外纳米压印光刻技术（UV-NIL）是一种具有小于10纳米分辨率的高产量且经济高效的图案化技术。作为下一代光刻技术的候选技术，它具有巨大潜力。利用UV-NIL，在中等条件下成功地在四英寸绝缘体上硅（SOI）晶圆上制备了纳米线图案。通过场发射扫描电子显微镜（FE-SEM）对制备的纳米线图案进行了表征。通过半导体参数分析证实了其电学性质。使用化学连接剂将抗β-淀粉样蛋白（1-42）单克隆抗体固定在硅纳米线上。利用这种制备的硅纳米线器件，根据电导与时间的特性成功测定了1皮摩尔至100纳摩尔的β-淀粉样蛋白（1-42）水平。因此，纳米图案化的SOI纳米线器件可应用于蛋白质检测的生物平台。
