Kim S H, Yoo I S, Kim J H, Yoon H H
Department of Chemical Engineering, Kyungwon University, Seongnam, Gyeonggi-Do 461-701, S. Korea.
J Nanosci Nanotechnol. 2011 May;11(5):4615-9. doi: 10.1166/jnn.2011.3682.
Thin films of SDC for SOFC electrolyte were prepared using electron beam deposition technique. The influence of annealing temperature, substrate temperature and e-beam gun power on the structure and surface morphology of the thin films was examined. It was found that the SDC thin films annealed at 800 degrees C consisted of a single cubic phase and the main crystal structure of the thin films represented those of evaporated electrolyte powders. The crystal orientation of the SDC films increased with substrate temperature and decreased with e-beam gun power. The higher XRD peak intensity was observed for the SDC films deposited on NiO-YSZ substrate compared with those on SiO2 substrate due to the polycrystalline structure of the NiO-YSZ substrate. A good adhesion to the substrate and a columnar structure were observed by the fractured cross-sectional view of the SDC films on NiO-YSZ anode substrate. Electrical conductivity of SDC film with 5 microm thickness was observed to be 2.31 x 10(-3) Sm(-1) at 800 degrees C.
采用电子束沉积技术制备了用于固体氧化物燃料电池（SOFC）电解质的SDC薄膜。研究了退火温度、衬底温度和电子束枪功率对薄膜结构和表面形貌的影响。结果发现，在800℃退火的SDC薄膜由单一立方相组成，薄膜的主要晶体结构与蒸发的电解质粉末的晶体结构一致。SDC薄膜的晶体取向随衬底温度升高而增加，随电子束枪功率降低而减小。由于NiO-YSZ衬底的多晶结构，与沉积在SiO2衬底上的SDC薄膜相比，沉积在NiO-YSZ衬底上的SDC薄膜观察到更高的X射线衍射（XRD）峰强度。通过NiO-YSZ阳极衬底上SDC薄膜的断裂横截面视图观察到与衬底的良好附着力和柱状结构。观察到厚度为5微米的SDC薄膜在800℃时的电导率为2.31×10⁻³ S·m⁻¹。
