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透明氧化物半导体中的电导率。

Conductivity in transparent oxide semiconductors.

机构信息

School of Physics and Astronomy, University of St Andrews, North Haugh, St Andrews KY16 9SS, UK.

出版信息

J Phys Condens Matter. 2011 Aug 24;23(33):334214. doi: 10.1088/0953-8984/23/33/334214. Epub 2011 Aug 3.

Abstract

Despite an extensive research effort for over 60 years, an understanding of the origins of conductivity in wide band gap transparent conducting oxide (TCO) semiconductors remains elusive. While TCOs have already found widespread use in device applications requiring a transparent contact, there are currently enormous efforts to (i) increase the conductivity of existing materials, (ii) identify suitable alternatives, and (iii) attempt to gain semiconductor-engineering levels of control over their carrier density, essential for the incorporation of TCOs into a new generation of multifunctional transparent electronic devices. These efforts, however, are dependent on a microscopic identification of the defects and impurities leading to the high unintentional carrier densities present in these materials. Here, we review recent developments towards such an understanding. While oxygen vacancies are commonly assumed to be the source of the conductivity, there is increasing evidence that this is not a sufficient mechanism to explain the total measured carrier concentrations. In fact, many studies suggest that oxygen vacancies are deep, rather than shallow, donors, and their abundance in as-grown material is also debated. We discuss other potential contributions to the conductivity in TCOs, including other native defects, their complexes, and in particular hydrogen impurities. Convincing theoretical and experimental evidence is presented for the donor nature of hydrogen across a range of TCO materials, and while its stability and the role of interstitial versus substitutional species are still somewhat open questions, it is one of the leading contenders for yielding unintentional conductivity in TCOs. We also review recent work indicating that the surfaces of TCOs can support very high carrier densities, opposite to the case for conventional semiconductors. In thin-film materials/devices and, in particular, nanostructures, the surface can have a large impact on the total conductivity in TCOs. We discuss models that attempt to explain both the bulk and surface conductivity on the basis of bulk band structure features common across the TCOs, and compare these materials to other semiconductors. Finally, we briefly consider transparency in these materials, and its interplay with conductivity. Understanding this interplay, as well as the microscopic contenders for providing the conductivity of these materials, will prove essential to the future design and control of TCO semiconductors, and their implementation into novel multifunctional devices.

摘要

尽管在过去的 60 多年里进行了广泛的研究,但对于宽带隙透明导电氧化物 (TCO) 半导体中电导率的起源仍难以理解。虽然 TCO 已经在需要透明接触的器件应用中得到了广泛的应用,但目前仍在努力(i)提高现有材料的电导率,(ii)寻找合适的替代品,以及(iii)尝试对其载流子密度进行半导体工程级别的控制,这对于将 TCO 纳入新一代多功能透明电子设备至关重要。然而,这些努力取决于对导致这些材料中存在高非故意载流子密度的缺陷和杂质进行微观识别。在这里,我们回顾了最近在这方面的进展。虽然氧空位通常被认为是导电性的来源,但越来越多的证据表明,这不足以解释总测量的载流子浓度。事实上,许多研究表明,氧空位是深而不是浅的施主,它们在生长材料中的丰度也存在争议。我们讨论了 TCO 中导电性的其他潜在贡献,包括其他本征缺陷、它们的复合物,特别是氢杂质。提出了一系列 TCO 材料中氢的施主性质的令人信服的理论和实验证据,虽然氢的稳定性和间隙与取代物种的作用仍然存在一些悬而未决的问题,但它是导致 TCO 中非故意电导率的主要候选者之一。我们还回顾了最近的工作,表明 TCO 的表面可以支持非常高的载流子密度,与常规半导体的情况相反。在薄膜材料/器件中,特别是在纳米结构中,表面对 TCO 的总电导率有很大的影响。我们讨论了试图根据 TCO 共有的体带结构特征来解释体和表面电导率的模型,并将这些材料与其他半导体进行了比较。最后,我们简要考虑了这些材料的透明度及其与电导率的相互作用。了解这种相互作用,以及为这些材料提供电导率的微观竞争者,对于未来 TCO 半导体的设计和控制及其在新型多功能设备中的应用将是至关重要的。

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