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CdO 中电导率和掺杂极限的混合密度泛函理论来源。

Sources of conductivity and doping limits in CdO from hybrid density functional theory.

机构信息

School of Chemistry and CRANN, Trinity College Dublin, Dublin 2, Ireland.

出版信息

J Am Chem Soc. 2011 Sep 28;133(38):15065-72. doi: 10.1021/ja204639y. Epub 2011 Sep 2.

Abstract

CdO has been studied for decades as a prototypical wide band gap transparent conducting oxide with excellent n-type ability. Despite this, uncertainty remains over the source of conductivity in CdO and over the lack of p-type CdO, despite its valence band maximum (VBM) being high with respect to other wide band gap oxides. In this article, we use screened hybrid DFT to study intrinsic defects and hydrogen impurities in CdO and identify for the first time the source of charge carriers in this system. We explain why the oxygen vacancy in CdO acts as a shallow donor and does not display negative-U behavior similar to all other wide band gap n-type oxides. We also demonstrate that p-type CdO is not achievable, as n-type defects dominate under all growth conditions. Lastly, we estimate theoretical doping limits and explain why CdO can be made transparent by a large Moss-Burstein shift caused by suitable n-type doping.

摘要

CdO 作为一种典型的具有优异 n 型能力的宽禁带透明导电氧化物,已经被研究了几十年。尽管如此,对于 CdO 的电导率来源以及缺乏 p 型 CdO 仍然存在不确定性,尽管其价带最大值 (VBM) 相对于其他宽禁带氧化物较高。在本文中,我们使用屏蔽杂化 DFT 来研究 CdO 中的本征缺陷和氢杂质,并首次确定了该体系中载流子的来源。我们解释了为什么 CdO 中的氧空位充当浅施主,并且不表现出类似于所有其他宽禁带 n 型氧化物的负-U 行为。我们还证明了 p 型 CdO 是不可能实现的,因为在所有生长条件下 n 型缺陷都占主导地位。最后,我们估计了理论掺杂极限,并解释了为什么通过适当的 n 型掺杂引起的大 Moss-Burstein 位移可以使 CdO 透明。

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