Yao Yunxi, Fu Qiang, Tan Dali, Bao Xinhe
State Key Laboratory of Catalysis, Dalian Institute of Chemical Physics, The Chinese Academy of Sciences, Dalian 116023, People's Republic of China.
J Phys Condens Matter. 2009 Aug 5;21(31):314014. doi: 10.1088/0953-8984/21/31/314014. Epub 2009 Jul 7.
The reactivity of a bulk Ag surface, an Ag monolayer film on Si(111)- 7 × 7 (denoted as the [Formula: see text]-Ag-Si surface), and Si(111)-7 × 7 to CCl(4) was investigated by x-ray photoelectron spectroscopy (XPS) and ultraviolet photoemission electron microscopy (UV-PEEM). In situ UV-PEEM was used to monitor simultaneously the CCl(4) dissociation on different surface domains, including the bulk Ag, [Formula: see text]-Ag-Si, and Si(111). The PEEM results combined with XPS data show that CCl(4) adsorbs dissociatively on bulk Ag(111) and Si(111) but adsorbs molecularly on the [Formula: see text]-Ag-Si surface, and the surface reactivity follows the order of [Formula: see text]-Ag-Si.
通过X射线光电子能谱（XPS）和紫外光发射电子显微镜（UV-PEEM）研究了块状银表面、Si(111)-7×7上的银单层膜（表示为[化学式：见原文]-Ag-Si表面）以及Si(111)-7×7对CCl₄的反应活性。原位UV-PEEM用于同时监测CCl₄在不同表面区域的解离情况，包括块状银、[化学式：见原文]-Ag-Si和Si(111)。PEEM结果与XPS数据相结合表明，CCl₄在块状Ag(111)和Si(111)上发生解离吸附，但在[化学式：见原文]-Ag-Si表面上发生分子吸附，并且表面反应活性遵循[化学式：见原文]-Ag-Si的顺序。
