Han Chang-Fu, Wu Bo-Hsiung, Lin Jen-Fin, Chung Chen-Kuei
Department of Mechanical Engineering, National Cheng Kung University, Tainan 701, Taiwan, Republic of China.
Nanotechnology. 2008 Aug 13;19(32):325710. doi: 10.1088/0957-4484/19/32/325710. Epub 2008 Jul 4.
A general mechanical model, which is composed of the mechanical models employed to describe the contact behaviors and deformations arising in all layers (including the substrate), is successfully developed in the present study for multilayer specimens in order to evaluate the contact projected area by a theoretical model, and thus the hardness and reduced modulus, using nanoindentation tests. The governing differential equations for the depth solutions of the indenter tip formed at all layers of the specimen under their contact load are developed individually. The influence of the material properties of the substrate on a multilayer specimen's hardness and reduced modulus at various indentation depths can thus be evaluated. Transition and pop-in occurred at depths near, but still before, the C (top layer)/a-Si (buffer layer) interface and the a-Si/Si (substrate) interface, respectively. Using the present analysis, the depths corresponding to the transition and pop-in behaviors can be predicted effectively.
在本研究中,成功开发了一种通用力学模型,该模型由用于描述所有层(包括基底)中出现的接触行为和变形的力学模型组成,用于多层试样,以便通过理论模型评估接触投影面积,从而利用纳米压痕试验评估硬度和折合模量。分别推导了试样各层在接触载荷作用下压痕尖端深度解的控制微分方程。由此可以评估基底材料特性对多层试样在不同压痕深度下的硬度和折合模量的影响。转变和压入分别发生在靠近但仍在C(顶层)/a-Si(缓冲层)界面和a-Si/Si(基底)界面之前的深度处。利用本分析方法,可以有效地预测与转变和压入行为对应的深度。