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纳米级颜色控制:通过磁控溅射沉积的W-O梯度涂层。

Nanoscale colour control: W-O graded coatings deposited by magnetron sputtering.

作者信息

Polcar T, Kubart T, Malainho E, Vasilevskiy M, Parreira N M G, Cavaleiro A

机构信息

Department of Control Engineering, Faculty of Electrical Engineering, Czech Technical University in Prague, Technická 2, Prague 6, Czech Republic. SEG-CEMUC-Department of Mechanical Engineering, University of Coimbra, Rua Luís Reis Santos, P-3030 788 Coimbra, Portugal.

出版信息

Nanotechnology. 2008 Oct 1;19(39):395202. doi: 10.1088/0957-4484/19/39/395202. Epub 2008 Aug 8.

DOI:10.1088/0957-4484/19/39/395202
PMID:21832587
Abstract

A new design of decorative tungsten oxide coatings is presented. The coatings were deposited with a graded refractive index by magnetron sputtering from a tungsten target and pulsing the reactive gas. The controlled injection of the reactive gas can produce a concentration profile gradient from pure tungsten to tungsten trioxide, determining the final apparent colour of the coating. A dynamic sputtering model was built to simulate the growth of the coating during the reactive gas pulsing which was validated by direct measurement of the gradient of the oxygen content in the deposited coatings. Finally, these results were used for an optical model allowing the optical properties of the deposited tungsten oxide layer to be described, again validated by experimental analysis. This procedure allows the deposition of coatings with the desired colour by using the models to finding the optimal oxygen pulse parameters. This proposed method can be easily applied to almost any metal/metal oxide system.

摘要

本文介绍了一种装饰性氧化钨涂层的新设计。通过磁控溅射从钨靶材沉积涂层,并对反应气体进行脉冲处理,从而获得具有渐变折射率的涂层。反应气体的受控注入可产生从纯钨到三氧化钨的浓度分布梯度,进而决定涂层的最终表观颜色。构建了一个动态溅射模型,以模拟反应气体脉冲期间涂层的生长过程,该模型通过直接测量沉积涂层中氧含量的梯度得到验证。最后,这些结果被用于光学模型,以描述沉积氧化钨层的光学特性,同样通过实验分析得到验证。该程序通过使用模型来寻找最佳的氧脉冲参数,从而实现具有所需颜色的涂层的沉积。这种提出的方法几乎可以轻松应用于任何金属/金属氧化物体系。

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