Soppera Olivier, Dirani Ali, Ponche Arnaud, Roucoules Vincent
Département de Photochimie Générale, Université de Haute-Alsace, CNRS-UMR 7525, 34 rue Marc Seguin, F-68058 Mulhouse Cedex, France.
Nanotechnology. 2008 Oct 1;19(39):395304. doi: 10.1088/0957-4484/19/39/395304. Epub 2008 Aug 8.
A new method is described for producing patterned solid surfaces with reactive groups. This entails pulsed plasma deposition of anhydride functionalized films, followed by the covalent attachment of an amine-terminated nucleophile via aminolysis reaction. Characterization of the surface chemistry was achieved by XPS, PM-IRRAS and contact angle measurement. Patterning was achieved by DUV irradiation using an ArF excimer laser and an interferometric set-up. Well-defined patterns have been obtained at different scales on a large surface area and using this unique procedure. Spectroscopic characterizations coupled with AFM measurements allow explanation to some measure of the photoinduced phenomena. Trenches with a width ranging from 75 to 500 nm and a depth up to 30 nm were written. Using this approach it is possible to create combinatorial patterned surfaces with well-controlled topography and chemistry.
描述了一种用于制备具有反应性基团的图案化固体表面的新方法。这需要对酸酐官能化薄膜进行脉冲等离子体沉积，然后通过氨解反应将胺端基亲核试剂共价连接。通过XPS、PM-IRRAS和接触角测量实现了表面化学表征。使用ArF准分子激光器和干涉仪装置通过深紫外辐射实现图案化。采用这种独特的方法，已在大面积的不同尺度上获得了明确的图案。光谱表征与原子力显微镜测量相结合，在一定程度上解释了光诱导现象。写入了宽度范围为75至500nm、深度达30nm的沟槽。使用这种方法，可以创建具有良好控制的形貌和化学性质的组合图案化表面。
