Holzwarth Charles W, Foulkes John E, Blaikie Richard J
MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Electrical and Computer Engineering, University of Christchurch, Christchurch, New Zealand.
Opt Express. 2011 Aug 29;19(18):17790-8. doi: 10.1364/OE.19.017790.
Absorbance-modulated lithography is a relatively new optical patterning method where a thin layer of photochromic molecules is placed between the far-field optics and photoresist. These molecules can be made transparent or opaque by illuminating with wavelengths λ1 or λ2, respectively. By simultaneously illuminating this layer with patterns of both wavelengths it is possible to create an absorption mask capable of subwavelength resolution. This resolution comes at the price of limited contrast and depth-of-focus resulting in poor process latitude. Here it is shown that by using TM polarization for λ1 and integrating a plasmonic reflector process latitude is increased by up to 66%.
吸光度调制光刻是一种相对较新的光学图案化方法，其中一层光致变色分子置于远场光学器件和光刻胶之间。分别用波长λ1或λ2照射时，这些分子可以变得透明或不透明。通过同时用两种波长的图案照射该层，可以创建一个具有亚波长分辨率的吸收掩模。这种分辨率是以有限的对比度和焦深为代价的，导致工艺宽容度较差。本文表明，通过对λ1使用TM偏振并集成一个等离子体反射器，工艺宽容度可提高高达66%。
