Foulkes John E, Blaikie Richard J
MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Electrical and Computer Engineering, University of Canterbury, Christchurch, New Zealand.
J Opt Soc Am A Opt Image Sci Vis. 2011 Nov 1;28(11):2218-25. doi: 10.1364/JOSAA.28.002218.
The ability to improve the transmission and intensity profiles in absorbance-modulation optical lithography (AMOL) [J. Opt. Soc. Am. A 23, 2290 (2006) and Phys. Rev. Lett. 98, 043905 (2007)] through the introduction of a plasmonic metal layer is investigated. In this part of the work, a plasmonic layer is placed between the absorbance-modulation layer and the photoresist layer. Transmission through this layer is possible due to the ability of thin plasmonic layers to act as near-field analogues of negative refraction materials. The superlens performance is best with a thin layer of 10-20 nm, although this causes a full width at half-maximum increase of ~50%. The introduction of the plasmonic layers allows dichroic filtering of the two wavelengths, with a difference of a factor of 10 in the transmitted intensity ratio, reducing undesirable exposure of the resist. The presented work demonstrates that a plasmonic layer can be interfaced with an AMOL system, but that further optimization and material development are needed to allow substantial performance improvements.
研究了通过引入等离子体金属层来改善吸收调制光刻（AMOL）[《美国光学学会志A》23, 2290 (2006)以及《物理评论快报》98, 043905 (2007)]中的传输和强度分布的能力。在这项工作的这一部分中，在吸收调制层和光刻胶层之间放置了一个等离子体层。由于薄等离子体层能够充当负折射材料的近场类似物，所以光可以透过该层。尽管这会使半高宽增加约50%，但对于10 - 20 nm的薄层，超透镜性能最佳。等离子体层的引入允许对两种波长进行二向色性滤波，透射强度比相差10倍，减少了光刻胶的不必要曝光。所展示的工作表明等离子体层可以与AMOL系统相结合，但需要进一步优化和材料开发以实现显著的性能提升。
