Cao Yaoyu, Gan Zongsong, Jia Baohua, Evans Richard A, Gu Min
Centre for Micro-Photonics, Faculty of Engineering and Industrial Science, Swinburne University of Technology, P.O. Box 218 Hawthorn, VIC 3122, Australia.
Opt Express. 2011 Sep 26;19(20):19486-94. doi: 10.1364/OE.19.019486.
An ethoxylated bis-phenol-A dimethacrylate based photoresin BPE-100 of relatively high photosensitivity and modulus is used for the creation of sub-50 nm features. This is achieved by using the direct laser writing technique based on the single-photon photoinhibited polymerization. The super-resolution feature is realized by overlapping two laser beams of different wavelengths to enable the wavelength-controlled activation of photoinitiating and photoinhibiting processes in the polymerization. The increased photosensitivity of the photoresin promotes a fast curing speed and enhances the photopolymerization efficiency. Using the photoresin BPE-100, we achieve 40 nm dots for the first time in the super-resolution fabrication technique based on the photoinhibited polymerization, and a minimum linewidth of 130 nm. The influence of the power of the inhibiting laser and the exposure time on the feature size is studied and the results agree well with the prediction obtained from a simulation based on a non-steady-state kinetic model.
一种具有较高光敏性和模量的基于乙氧基化双酚 A 二甲基丙烯酸酯的光致抗蚀剂 BPE - 100 被用于制造小于 50 纳米的特征结构。这是通过基于单光子光抑制聚合的直接激光写入技术实现的。通过重叠两束不同波长的激光束来实现超分辨率特征，从而在聚合过程中实现波长控制的光引发和光抑制过程的激活。光致抗蚀剂光敏性的提高促进了快速固化速度并提高了光聚合效率。使用光致抗蚀剂 BPE - 100，我们在基于光抑制聚合的超分辨率制造技术中首次实现了 40 纳米的点，以及 130 纳米的最小线宽。研究了抑制激光功率和曝光时间对特征尺寸的影响，结果与基于非稳态动力学模型的模拟预测结果吻合良好。
