Institute of Photonics and Photo-technology, International Scientific and Technological Cooperation Base of Photoelectric Technology and Functional Materials and Application, Northwest University, 229 North Taibai Rd, Xi'an, 710069, People's Republic of China.
Nanoscale Res Lett. 2013 Jun 11;8(1):280. doi: 10.1186/1556-276X-8-280.
Nanoscale functional structures are indispensable elements in many fields of modern science. In this paper, nanopillar array with a pillar diameter far smaller than Abbe's diffraction limit is realized by a new kind of continuous wave (CW) laser direct lithography technology. With atomic force microscopy technology, the average diameter of nanopillars on thin OIR906 photoresist film is about 65 nm and the smallest diameter is 48 nm, which is about 1/11 of the incident laser wavelength. Also, the influences of coma and astigmatism effects to the shape and size of nanopillar are numerically simulated by utilizing vector integral. As far as we know, it is the first time that nanopillar array is implemented by a donut-shaped 532-nm visible CW laser. The study presents a new, simple, inexpensive, and effective approach for nanopillar/pore array fabrication.
纳米级功能结构是现代科学许多领域不可或缺的元素。在本文中，通过一种新型连续波（CW）激光直写技术实现了远小于阿贝衍射极限的纳米柱阵列。利用原子力显微镜技术，在薄的 OIR906 光刻胶薄膜上的纳米柱的平均直径约为 65nm，最小直径为 48nm，约为入射激光波长的 1/11。此外，还利用矢量积分对彗差和像散效应对纳米柱形状和尺寸的影响进行了数值模拟。据我们所知，这是首次使用环形 532nm 可见 CW 激光实现纳米柱阵列。该研究为纳米柱/孔阵列的制造提供了一种新颖、简单、经济、有效的方法。
