Department of Chemistry, University of Minnesota, Minneapolis, Minnesota 55455, USA.
J Am Chem Soc. 2011 Dec 14;133(49):19864-77. doi: 10.1021/ja207751w. Epub 2011 Nov 15.
The tunneling resistance and electronic structure of metal-molecule-metal junctions based on oligoacene (benzene, naphthalene, anthracene, and tetracene) thiol and dithiol molecules were measured and correlated using conducting probe atomic force microscopy (CP-AFM) in conjunction with ultraviolet photoelectron spectroscopy (UPS). Nanoscopic tunnel junctions (~10 nm(2)) were formed by contacting oligoacene self-assembled monolayers (SAMs) on flat Ag, Au, or Pt substrates with metalized AFM tips (Ag, Au, or Pt). The low bias (<0.2 V) junction resistance (R) increased exponentially with molecular length (s), i.e., R = R(0) exp(βs), where R(0) is the contact resistance and β is the tunneling attenuation factor. The R(0) values for oligoacene dithiols were 2 orders of magnitude less than those of oligoacene thiols. Likewise, the β value was 0.5 per ring (0.2 Å(-1)) for the dithiol series and 1.0 per ring (0.5 Å(-1)) for the monothiol series, demonstrating that β is not simply a characteristic of the molecular backbone but is strongly affected by the number of chemical (metal-S) contacts. R(0) decreased strongly as the contact work function (Φ) increased for both monothiol and dithiol junctions, whereas β was independent of Φ within error. This divergent behavior was explained in terms of the metal-S bond dipoles and the electronic structure of the junction; namely, β is independent of contact type because of weak Fermi level pinning (UPS revealed E(F) - E(HOMO) varied only weakly with Φ), but R(0) varies strongly with contact type because of the strong metal-S bond dipoles that are responsible for the Fermi level pinning. A previously published triple barrier model for molecular junctions was invoked to rationalize these results in which R(0) is determined by the contact barriers, which are proportional to the size of the interfacial bond dipoles, and β is determined by the bridge barrier, E(F) - E(HOMO). Current-voltage (I-V) characteristics obtained over a larger voltage range 0-1 V revealed a characteristic transition voltage V(trans) at which the current increased more sharply with voltage. V(trans) values were generally >0.5 V and were well correlated with the bridge barrier E(F) - E(HOMO). Overall, the combination of electronic structure determination by UPS with length- and work function-dependent transport measurements provides a remarkably comprehensive picture of tunneling transport in molecular junctions based on oligoacenes.
基于寡聚芳烃(苯、萘、蒽和并四苯)硫醇和二硫醇分子的金属-分子-金属结的隧道电阻和电子结构使用导电探针原子力显微镜 (CP-AFM) 结合紫外光电子能谱 (UPS) 进行了测量和关联。通过将寡聚芳烃自组装单层 (SAM) 与金属化的 AFM 尖端(Ag、Au 或 Pt)接触,在平坦的 Ag、Au 或 Pt 衬底上形成纳米级隧道结(~10nm(2))。在低偏压(<0.2V)下,结电阻(R)随分子长度(s)呈指数增长,即 R=R(0)exp(βs),其中 R(0)是接触电阻,β是隧道衰减因子。寡聚芳烃二硫醇的 R(0) 值比寡聚芳烃硫醇小 2 个数量级。同样,对于二硫醇系列,β 值为每个环 0.5(0.2Å(-1)),对于单硫醇系列,β 值为每个环 1.0(0.5Å(-1)),表明β 不仅是分子主链的特征,而且还受到化学(金属-S)接触数量的强烈影响。对于单硫醇和二硫醇结,R(0)随着接触功函数(Φ)的增加而强烈降低,而β在误差范围内与Φ无关。这种发散行为可以根据金属-S 键偶极子和结的电子结构来解释;即,由于费米能级钉扎较弱(UPS 显示 E(F) - E(HOMO) 仅随 Φ 微弱变化),β 与接触类型无关,但由于负责费米能级钉扎的强金属-S 键偶极子,R(0) 随接触类型强烈变化。先前发表的分子结三势垒模型被用来合理化这些结果,其中 R(0)由接触势垒决定,接触势垒与界面键偶极子的大小成正比,而β由桥势垒 E(F) - E(HOMO) 决定。在 0-1V 的更大电压范围内获得的电流-电压(I-V)特性显示出特征转换电压 V(trans),在该电压下电流随电压的增加更为急剧。V(trans)值通常>0.5V,与桥势垒 E(F) - E(HOMO) 很好地相关。总的来说,UPS 确定的电子结构与长度和功函数相关的输运测量相结合,为基于寡聚芳烃的分子结中的隧道输运提供了一个非常全面的图景。