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药物和化学性光敏反应。

Drug and chemical photosensitivity.

作者信息

Johnson B E, Ferguson J

机构信息

Department of Dermatology, University of Dundee, Scotland, U.K.

出版信息

Semin Dermatol. 1990 Mar;9(1):39-46.

PMID:2203442
Abstract

Chemical (especially drug-induced) cutaneous photo-sensitization is an increasing problem in dermatology. Various molecular, biochemical, and pathophysiologic processes are involved in translation of ultraviolet (UV) or visible radiation energy into phototoxic and/or photoallergic reactions in the skin. Phototoxicity presents in four major reaction patterns, depending on the target for photosensitization. Photoallergy is now confirmed as an immune system cell mediated photosensitization. Drug-induced photosensitivity is not necessarily a good reason for stopping therapy. Sunlight avoidance, appropriate protection with clothing, sunscreens, and drug dose reduction may allow continuation of treatment. However, future drug registration procedures may require more detailed testing both in vitro and in vivo, and good clinical trials for which suitable protocols are becoming available.

摘要

化学性(尤其是药物引起的)皮肤光致敏在皮肤科领域是一个日益严重的问题。各种分子、生化和病理生理过程参与了将紫外线(UV)或可见光辐射能量转化为皮肤中的光毒性和/或光过敏反应。根据光致敏的靶点不同,光毒性表现为四种主要反应模式。光过敏现已被确认为免疫系统细胞介导的光致敏。药物引起的光敏反应不一定是停止治疗的充分理由。避免阳光照射、使用衣物、防晒霜进行适当防护以及减少药物剂量可能允许继续治疗。然而,未来的药物注册程序可能需要更详细的体外和体内测试,以及适用方案日益完善的良好临床试验。

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