Department of Materials Science and Engineering, Yonsei University, Seoul, Korea.
ACS Appl Mater Interfaces. 2011 Dec;3(12):4736-43. doi: 10.1021/am201202w. Epub 2011 Nov 29.
In this study, we demonstrated a facile route for enhancing the ferroelectric polarization of a chemically cross-linked poly(vinylidene fluoride-co-trifluoro ethylene) (PVDF-TrFE) film. Our method is based on thermally induced cross-linking of a PVDF-TrFE film with a 2,2,4-trimethyl-1,6-hexanediamine (THDA) agent under compression. The remanent polarization (P(r)) of a metal/ferroelectric/metal capacitor containing a cross-linked PVDF-TrFE film increased with pressure up to a certain value, whereas no change in the P(r) value was observed in the absence of THDA. A film cross-linked with 10 wt % THDA with respect to PVDF-TrFE under a pressure of 100 kPa exhibited a P(r) of approximately 5.61 μC/cm(2), which is 1.6 times higher than that in the absence of pressure. The enhanced ferroelectric polarization was attributed to highly ordered 20-nm-thick edge-on crystalline lamellae whose c-axes are aligned parallel to the substrate. The lamellae were effective for ferroelectric switching of the PVDF-TrFE when a cross-linked film was recrystallized under pressure. Furthermore, compression of a PVDF-TrFE film with a topographically prepatterned poly(dimethyl siloxane) mold gave rise to a chemically cross-linked micropattern in which edge-on crystalline lamellae were globally oriented over a very large area.
在这项研究中,我们展示了一种增强化学交联聚偏氟乙烯-三氟乙烯(PVDF-TrFE)膜铁电极化的简便方法。我们的方法基于在压缩下用 2,2,4-三甲基-1,6-己二胺(THDA)试剂对 PVDF-TrFE 膜进行热诱导交联。含有交联 PVDF-TrFE 膜的金属/铁电/金属电容器的剩余极化(P(r))随压力增加到一定值而增加,而在没有 THDA 的情况下,P(r)值没有变化。在 100 kPa 下,相对于 PVDF-TrFE 交联 10wt%THDA 的膜表现出约 5.61 μC/cm(2)的 P(r),这比没有压力时高 1.6 倍。增强的铁电极化归因于高度有序的 20nm 厚的边缘晶薄片,其 c 轴与基底平行排列。当交联膜在压力下重新结晶时,这些薄片对于 PVDF-TrFE 的铁电开关是有效的。此外,用具有地形预图案的聚二甲基硅氧烷(PDMS)模具压缩 PVDF-TrFE 膜会导致化学交联的微图案,其中边缘晶薄片在很大的区域上整体取向。