Samélor Diane, Lazar Ana-Maria, Aufray Maëlenn, Tendero Claire, Lacroix Loïc, Béguin Jean-Denis, Caussat Brigitte, Vergnes Hugues, Alexis Joël, Poquillon Dominique, Pébère Nadine, Gleizes Alain, Vahlas Constantin
University of Toulouse, CIRIMAT/INP T, 4 allée Emile Monso BP 44362, 31030 Toulouse cedex 4, France.
J Nanosci Nanotechnol. 2011 Sep;11(9):8387-91. doi: 10.1166/jnn.2011.5068.
Amorphous aluminium oxide coatings were processed by metalorganic chemical vapour deposition (MOCVD); their structural characteristics were determined as a function of the processing conditions, the process was modelled considering appropriate chemical kinetic schemes, and the properties of the obtained material were investigated and were correlated with the nanostructure of the coatings. With increasing processing temperature in the range 350 degrees C-700 degrees C, subatmospheric MOCVD of alumina from aluminium tri-isopropoxide (ATI) sequentially yields partially hydroxylated amorphous aluminium oxides, amorphous Al2O3 (415 degrees C-650 degrees C) and nanostructured gamma-Al2O3 films. A numerical model for the process allowed reproducing the non uniformity of deposition rate along the substrate zone due to the depletion of ATI. The hardness of the coatings prepared at 350 degrees C, 480 degrees C and 700 degrees C is 6 GPa, 11 GPa and 1 GPa, respectively. Scratch tests on films grown on TA6V titanium alloy reveal adhesive and cohesive failures for the amorphous and nanocrystalline ones, respectively. Alumina coating processed at 480 degrees C on TA6V yielded zero weight gain after oxidation at 600 degrees C in lab air. The surface of such low temperature processed amorphous films is hydrophobic (water contact angle 106 degrees), while the high temperature processed nanocrystalline films are hydrophilic (48 degrees at a deposition temperature of 700 degrees C). It is concluded that amorphous Al2O3 coatings can be used as oxidation and corrosion barriers at ambient or moderate temperature. Nanostructured with Pt or Ag nanoparticles, they can also provide anti-fouling or catalytic surfaces.
通过金属有机化学气相沉积(MOCVD)制备了非晶态氧化铝涂层;确定了其结构特征与工艺条件的函数关系,考虑适当的化学动力学方案对该工艺进行了建模,并研究了所得材料的性能及其与涂层纳米结构的相关性。在350℃至700℃范围内,随着加工温度的升高,由三异丙醇铝(ATI)进行的亚大气压MOCVD依次产生部分羟基化的非晶态氧化铝、非晶态Al2O3(415℃至650℃)和纳米结构的γ -Al2O3薄膜。该工艺的数值模型能够再现由于ATI耗尽导致的沿衬底区域沉积速率的不均匀性。在350℃、480℃和700℃制备的涂层硬度分别为6 GPa、11 GPa和1 GPa。在TA6V钛合金上生长的薄膜的划痕试验表明,非晶态薄膜和纳米晶态薄膜分别出现了粘附性失效和内聚性失效。在TA6V上于480℃加工的氧化铝涂层在实验室空气中600℃氧化后重量增加为零。这种低温加工的非晶态薄膜表面是疏水的(水接触角为106度),而高温加工的纳米晶态薄膜是亲水的(在沉积温度为700℃时为48度)。得出的结论是,非晶态Al2O3涂层可在环境温度或中等温度下用作氧化和腐蚀阻挡层。用Pt或Ag纳米颗粒进行纳米结构化后,它们还可提供防污或催化表面。