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通过基底翻转旋转制备具有不同形貌的双轴织构 Mo 薄膜。

Biaxially textured Mo films with diverse morphologies by substrate-flipping rotation.

机构信息

Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute, 110 8th street, Troy, NY 12180, USA.

出版信息

Nanotechnology. 2011 Dec 16;22(50):505701. doi: 10.1088/0957-4484/22/50/505701. Epub 2011 Nov 23.

DOI:10.1088/0957-4484/22/50/505701
PMID:22108380
Abstract

A class of nanostructured Mo thin films was grown by DC magnetron sputtering using a robust substrate rotation mode called 'flipping rotation'. In this rotation mode, the substrate is arranged to rotate continuously at a fixed speed around an axis lying within and parallel to the substrate. The incident flux is perpendicular to the rotational axis, and the incident flux angle changes continuously. Mo nanostructured films, grown under different rotation speeds with three orders of magnitude spread (ranging from 0.008 to 24 rotation min( - 1)), different flipping directions (clockwise and counter-clockwise), and different ending deposition angles, were characterized using scanning electron microscopy (SEM) and reflection high energy electron diffraction (RHEED) surface-pole-figure techniques. Despite their very different morphologies, such as 'C'-shaped, 'S'-shaped, and vertically aligned nanorods, the same [Formula: see text] biaxial texture with an average out-of-plane dispersion of ∼ 15° was observed. In contrast, we showed that only a fiber-textured Mo film was obtained by using the conventional rotation mode where the oblique incident flux angle was fixed with the substrate rotating around the surface normal.

摘要

采用一种称为“翻转旋转”的稳健基底旋转模式,通过直流磁控溅射生长了一类纳米结构 Mo 薄膜。在这种旋转模式中,基底被布置为围绕一个位于基底内部且与基底平行的轴以固定速度连续旋转。入射通量垂直于旋转轴,并且入射通量角连续变化。采用扫描电子显微镜(SEM)和反射高能电子衍射(RHEED)表面极图技术对在不同旋转速度下生长的 Mo 纳米结构薄膜进行了表征,旋转速度的范围很宽(从 0.008 到 24 转/分),翻转方向不同(顺时针和逆时针),结束沉积角度也不同。尽管形貌差异很大,如“C”形、“S”形和垂直排列的纳米棒,但都观察到相同的[Formula: see text]双轴织构,其面外分散度约为 15°。相比之下,我们表明,仅当使用传统的旋转模式时,其中斜入射通量角随基底围绕表面法线旋转而固定,才能获得纤维织构的 Mo 膜。

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