Environmental Molecular Science Laboratory and Institute for Integrated Catalysis, Pacific Northwest National Laboratory, Richland, WA 99352, USA.
Phys Chem Chem Phys. 2012 Mar 7;14(9):3066-74. doi: 10.1039/c1cp22515d. Epub 2011 Nov 22.
Combined scanning tunneling microscopy, temperature programmed desorption, photo stimulated desorption, and density functional theory studies have probed the formation and reactivity of highly-hydroxylated rutile TiO(2)(110) surfaces, which were prepared via a novel, photochemical route using trimethyl acetic acid (TMAA) dissociative adsorption and subsequent photolysis at 300 K. Deprotonation of TMAA molecules upon adsorption produces both surface bridging hydroxyls (OH(b)) and bidentate trimethyl acetate (TMA) species with a saturation coverage of nearly 0.5 monolayers (ML). Ultra-violet light irradiation selectively removes TMA species, producing a highly-hydroxylated surface with up to ~0.5 ML OH(b) coverage. At high coverages, the OH(b) species typically occupy second-nearest neighbor sites along the bridging oxygen row locally forming linear (2 × 1) structures of different lengths, although the surface is less ordered on a long scale. The annealing of the highly-hydroxylated surface leads to hydroxyl recombination and H(2)O desorption with ~100% yield, thus ruling out the diffusion of H into the bulk that has been suggested in the literature. In agreement with experimental data, theoretical results show that the recombinative H(2)O desorption is preferred over both H bulk diffusion and H(2) desorption processes.
结合扫描隧道显微镜、程序升温脱附、光刺激脱附和密度泛函理论研究,我们探究了高度羟基化锐钛矿 TiO(2)(110)表面的形成和反应性,这些表面是通过一种新的光化学途径使用三甲基乙酸(TMAA)离解吸附和随后在 300 K 下光解制备的。TMAA 分子在吸附时的去质子化产生了表面桥接羟基(OH(b))和双齿三甲基乙酸(TMA)物种,其饱和覆盖率接近 0.5 单层(ML)。紫外线光照射选择性地去除 TMA 物种,产生具有高达~0.5 ML OH(b)覆盖率的高度羟基化表面。在高覆盖率下,OH(b)物种通常占据桥氧行的第二近邻位置,局部形成不同长度的线性(2×1)结构,尽管在长尺度上表面的有序性较低。高度羟基化表面的退火导致羟基重组和 H(2)O 脱附,产率约为 100%,因此排除了文献中提出的 H 向体相扩散的可能性。与实验数据一致,理论结果表明,重组 H(2)O 脱附优先于 H 体相扩散和 H(2)脱附过程。