Serrano G, Bonillo J, Aliaga A, Cuadra J, Pujol C, Pelufo C, Cervera P, Miranda M A
Department of Dermatology, General Hospital, Valencia, Spain.
J Am Acad Dermatol. 1990 Sep;23(3 Pt 1):479-83. doi: 10.1016/0190-9622(90)70244-c.
A photocontact dermatitis developed in three patients after the application of gel containing 0.5% piroxicam. Patch tests were positive to thiomersal and thiosalicylic acid. Photopatch tests with piroxicam at several concentrations were positive in the three patients but negative in 62 normal volunteer subjects. Patch tests performed on 14 patients with proved systemic photosensitivity to piroxicam were positive for thiomersal and thiosalicylic acid. Nine of 12 patients previously sensitized to thiosalicylic acid and with no history of exposure to piroxicam showed positive photopatch test reactions to this chemical. These results support a relation between piroxicam-induced photosensitivity and contact sensitivity to thiosalicylic acid. Contact allergic sensitivity to the latter is a marker for patients with a high risk of developing photosensitivity reactions to piroxicam. These reactions may be due to photoproducts of the drug rather than metabolites.
三名患者在使用含0.5%吡罗昔康的凝胶后发生了光接触性皮炎。斑贴试验对硫柳汞和硫代水杨酸呈阳性。对这三名患者进行的不同浓度吡罗昔康光斑贴试验呈阳性，但62名正常志愿者受试者的试验结果为阴性。对14名已证实对吡罗昔康有全身性光过敏的患者进行的斑贴试验，对硫柳汞和硫代水杨酸呈阳性。12名先前对硫代水杨酸致敏且无吡罗昔康接触史的患者中，有9名对该化学物质的光斑贴试验反应呈阳性。这些结果支持吡罗昔康诱导的光过敏与对硫代水杨酸的接触过敏之间存在关联。对后者的接触性过敏敏感性是对吡罗昔康发生光过敏反应风险较高患者的一个标志。这些反应可能是由于药物的光产物而非代谢产物所致。
