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对硫柳汞过敏,对吡罗昔康光敏。

Sensitivity to thimerosal and photosensitivity to piroxicam.

作者信息

de Castro J L, Freitas J P, Brandão F M, Themido R

机构信息

Department of Dermatology, Hospital de Santa Maria, Lisbon, Portugal.

出版信息

Contact Dermatitis. 1991 Mar;24(3):187-92. doi: 10.1111/j.1600-0536.1991.tb01696.x.

Abstract

17 patients allergic to thimerosal, with no previous history of photosensitivity or piroxicam ingestion, 2 patients with piroxicam-induced photosensitivity, and 10 controls were patch or photopatch tested, with 1 or more of the following: thimerosal, thiosalicylic acid, irradiated and non-irradiated solutions of piroxicam alone, L-cysteine alone and piroxicam plus L-cysteine, and piroxicam in petrolatum., The results of the tests supported the hypothesis that there are cross-reactions between thiosalicylic acid and prioxicam, a photosensitizer. The mechanism of the cross-reactions may involve photoproducts of piroxicam and L-cysteine, as patients allergic to thiosalicylic acid, who have positive photopatch tests to piroxicam, also had positive patch tests to the irradiated solution of piroxicam plus L-cysteine.

摘要

对硫柳汞过敏、既往无光敏性病史或服用吡罗昔康史的17例患者,2例吡罗昔康诱发的光敏性患者,以及10例对照者接受了斑贴试验或光斑贴试验,使用以下1种或多种物质:硫柳汞、硫代水杨酸、单独的吡罗昔康照射及未照射溶液、单独的L-半胱氨酸以及吡罗昔康加L-半胱氨酸,还有凡士林基质中的吡罗昔康。试验结果支持了硫代水杨酸与光敏剂吡罗昔康之间存在交叉反应这一假说。交叉反应的机制可能涉及吡罗昔康和L-半胱氨酸的光产物,因为对硫代水杨酸过敏且对吡罗昔康光斑贴试验呈阳性的患者,对吡罗昔康加L-半胱氨酸的照射溶液斑贴试验也呈阳性。

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