Faculty of Engineering, Multimedia University, 63100 Cyberjaya, Selangor, Malaysia.
Nanotechnology. 2012 Jan 20;23(2):025706. doi: 10.1088/0957-4484/23/2/025706.
Low-temperature growth of indium tin oxide (ITO) nanowires (NWs) was obtained on catalyst-free amorphous glass substrates at 250 °C by Nd:YAG pulsed-laser deposition. These ITO NWs have branching morphology as grown in Ar ambient. As suggested by scanning electron microscopy (SEM) and high-resolution transmission electron microscopy (HRTEM), our ITO NWs have the tendency to grow vertically outward from the substrate surface, with the (400) plane parallel to the longitudinal axis of the nanowires. These NWs are low in electrical resistivity (1.6×10⁻⁴ Ω cm) and high in visible transmittance (~90–96%), and were tested as the electrode for organic light emitting devices (OLEDs). An enhanced current density of ~30 mA cm⁻² was detected at bias voltages of ~19–21 V with uniform and bright emission. We found that the Hall mobility of these NWs is 2.2–2.7 times higher than that of ITO film, which can be explained by the reduction of Coulomb scattering loss. These results suggested that ITO nanowires are promising for applications in optoelectronic devices including OLED, touch screen displays, and photovoltaic solar cells.
在 250°C 下,通过 Nd:YAG 脉冲激光沉积在无催化剂的非晶态玻璃衬底上获得了氧化铟锡(ITO)纳米线(NWs)的低温生长。这些 ITO NWs 在 Ar 环境中生长时具有分支形态。正如扫描电子显微镜(SEM)和高分辨率透射电子显微镜(HRTEM)所表明的那样,我们的 ITO NWs 具有从衬底表面垂直向外生长的趋势,(400)平面与纳米线的纵轴平行。这些 NWs 的电阻率低(1.6×10⁻⁴ Ω cm),可见光透过率高(约 90-96%),并被用作有机发光器件(OLEDs)的电极进行了测试。在偏置电压约为 19-21 V 时,检测到约 30 mA cm⁻² 的增强电流密度,具有均匀且明亮的发射。我们发现这些 NWs 的霍尔迁移率比 ITO 薄膜高 2.2-2.7 倍,这可以通过减少库仑散射损耗来解释。这些结果表明,ITO 纳米线在包括 OLED、触摸屏显示器和光伏太阳能电池在内的光电设备中具有广阔的应用前景。