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氢化石墨烯中的表面掺杂和带隙可调性。

Surface doping and band gap tunability in hydrogenated graphene.

机构信息

NRC Postdoctoral Associate, Naval Research Laboratory, Washington, DC 20375, USA.

出版信息

ACS Nano. 2012 Jan 24;6(1):17-22. doi: 10.1021/nn2034555. Epub 2012 Jan 10.

Abstract

We report the first observation of the n-type nature of hydrogenated graphene on SiO(2) and demonstrate the conversion of the majority carrier type from electrons to holes using surface doping. Density functional calculations indicate that the carrier type reversal is directly related to the magnitude of the hydrogenated graphene's work function relative to the substrate, which decreases when adsorbates such as water are present. Additionally, we show by temperature-dependent electronic transport measurements that hydrogenating graphene induces a band gap and that in the moderate temperature regime [220-375 K], the band gap has a maximum value at the charge neutrality point, is tunable with an electric field effect, and is higher for higher hydrogen coverage. The ability to control the majority charge carrier in hydrogenated graphene, in addition to opening a band gap, suggests potential for chemically modified graphene p-n junctions.

摘要

我们首次观察到氢化石墨烯在 SiO(2) 上的 n 型性质,并通过表面掺杂证明了多数载流子类型从电子到空穴的转换。密度泛函计算表明,载流子类型的反转与氢化石墨烯的功函数相对于衬底的大小直接相关,当存在水等吸附物时,功函数会降低。此外,我们通过温度相关的电子输运测量表明,氢化石墨烯诱导了带隙,并且在中等温度范围[220-375 K]内,带隙在电荷中性点处具有最大值,可通过电场效应进行调节,并且随着氢化覆盖率的增加而增加。在氢化石墨烯中控制多数电荷载流子的能力,除了打开带隙外,还表明了化学修饰的石墨烯 p-n 结的潜力。

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