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通过干涉光刻法制备二维叠加微结构

Fabrication of two-dimensional superposed microstructure by interference lithography.

作者信息

Lü Hao, Zhao Qiu-Ling, Zhang Qing-Yue, Niu Dong-Jie, Wang Xia

机构信息

Institute of Photonic Information Technology, School of Mathematics and Physics Department, Qingdao University of Science and Technology, Qingdao 266061, China.

出版信息

Appl Opt. 2012 Jan 20;51(3):302-5. doi: 10.1364/AO.51.000302.

Abstract

In this paper, we report the basic theory and method of single exposure interference lithography (IL) to fabricate two-dimensional (2D) superposed microstructures. Distribution of six-beam interference intensities with different azimuth angle is discussed, and 2D superposed microstructures with different periodic constants are obtained by computer simulations. The experiment results using CHP-C positive photoresist show a 2D superposed photonic crystal composed of a periodically repeated hexagonal pattern of hexagonal lattice cells, which is in close agreement with the computer simulation. Fabrication of a superposed structure by single exposure IL paves the way for studying 2D photonic crystal fabrication, surface lasing, optical waveguides, and so on.

摘要

在本文中,我们报道了用于制造二维(2D)叠加微结构的单次曝光干涉光刻(IL)的基本理论和方法。讨论了不同方位角下六束干涉强度的分布,并通过计算机模拟获得了具有不同周期常数的二维叠加微结构。使用CHP-C正性光刻胶的实验结果显示出由六边形晶格单元的周期性重复六边形图案组成的二维叠加光子晶体,这与计算机模拟结果非常吻合。通过单次曝光IL制造叠加结构为研究二维光子晶体制造、表面激光发射、光波导等铺平了道路。

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