Liu Zhichao, Chen Songlin, Ma Ping, Wei Yaowei, Zheng Yi, Pan Feng, Liu Hao, Tang Gengyu
Fine Optical Engineering Research Centre, Chengdu, China.
Opt Express. 2012 Jan 16;20(2):854-63. doi: 10.1364/OE.20.000854.
Damage tests are carried out at 1064nm to measure the laser resistance of TiO(2)/Al(2)O(3) and HfO(2)/Al(2)O(3) antireflection coatings grown by atomic layer deposition (ALD). The damage results are determined by S-on-1 and R-on-1 tests. Interestingly, the damage performance of ALD coatings is similar to those grown by conventional e-beam evaporation process. A decline law of damage resistance under multiple irradiations is revealed. The influence of growth temperature on damage performance has been investigated. Result shows that the crystallization of TiO(2) layer at higher temperature could lead to numerous absorption defects that reduce the laser-induced damage threshold (LIDT). In addition, it has been found that using inorganic compound instead of organic compound as precursors for ALD process maybe effectively prevent carbon impurities in films and will increase the LIDT obviously.
在1064nm波长下进行损伤测试，以测量通过原子层沉积（ALD）生长的TiO(2)/Al(2)O(3)和HfO(2)/Al(2)O(3)减反射涂层的抗激光性能。损伤结果通过1对1测试和R对1测试确定。有趣的是，ALD涂层的损伤性能与通过传统电子束蒸发工艺生长的涂层相似。揭示了多次辐照下抗损伤性能的下降规律。研究了生长温度对损伤性能的影响。结果表明，较高温度下TiO(2)层的结晶会导致大量吸收缺陷，从而降低激光诱导损伤阈值（LIDT）。此外，还发现使用无机化合物而非有机化合物作为ALD工艺的前驱体可以有效防止薄膜中的碳杂质，并将显著提高LIDT。
