Department of Metallurgic and Materials Engineering, Federal University of Rio de Janeiro, Rio de Janeiro, RJ, Brazil.
Microsc Res Tech. 2012 Jun;75(6):791-5. doi: 10.1002/jemt.21126. Epub 2012 Feb 1.
The aim of this study was to evaluate the effects of the 5.25% sodium hypochlorite (NaOCl), 2% chlorhexidine (CHX), and MTAD solutions on the surface of gutta-percha and Resilon cones by using atomic force microscopy (AFM). Accessory cones were washed and dried. The cones were randomly divided into six groups: gutta-percha immersed in NaOCl, CHX, and MTAD, and Resilon immersed in NaOCl, CHX, and MTAD. AFM images of the same area were made in different periods of time. JPK™ Image Processing Software was used to evaluate the images. The parameters used to evaluate the changes were RMS and line profiles. No statistically significant change was observed in the RMS values. The line profiles detected changes only for gutta-percha surfaces after immersion in NaOCl and MTAD solutions. In conclusion, 5.25% NaOCl and MTAD are associated with local changes in surface roughness of gutta-percha cones. No change was observed when 2% CHX was used. The use of all tested solutions did not produce any changes on Resilon surface.
本研究旨在通过原子力显微镜(AFM)评估 5.25%次氯酸钠(NaOCl)、2%洗必泰(CHX)和 MTAD 溶液对牙胶和 Resilon 锥表面的影响。附件锥经清洗和干燥后,随机分为六组:牙胶分别浸泡在 NaOCl、CHX 和 MTAD 溶液中,Resilon 分别浸泡在 NaOCl、CHX 和 MTAD 溶液中。在不同时间对同一区域进行 AFM 成像。使用 JPK™图像处理软件评估图像。用于评估变化的参数是 RMS 和线轮廓。RMS 值无统计学显著变化。仅在牙胶分别浸泡在 NaOCl 和 MTAD 溶液后,线轮廓检测到表面粗糙度发生变化。总之,5.25% NaOCl 和 MTAD 与牙胶锥表面局部粗糙度变化有关。使用 2% CHX 时未观察到变化。所有测试溶液的使用均未导致 Resilon 表面发生任何变化。