Department of Electrical and Computer Engineering, Micro and Nanotechnology Laboratory, University of Illinois at Urbana-Champaign, USA.
Nanotechnology. 2012 Mar 30;23(12):125202. doi: 10.1088/0957-4484/23/12/125202. Epub 2012 Mar 7.
We have fabricated nanotextured Si substrates that exhibit controllable optical reflection intensities and colors. Si nanopore has a photon trapping nanostructure but has abrupt changes in the index of refraction displaying a darkened specular reflection. Nanoscrew Si shows graded refractive-index photon trapping structures that enable diffuse reflection to be as low as 2.2% over the visible wavelengths. By tuning the 3D nanoscale silicon structure, the optical reflection peak wavelength and intensity are changed in the wavelength range of 300-800 nm, making the surface have different reflectivity and apparent colors. The relation between the surface optical properties with the spatial features of the photon trapping nanostructures is examined. Integration of photon trapping structures with planar Si structure on the same substrate is also demonstrated. The tunable photon trapping silicon structures have potential applications in enhancing the performance of semiconductor photoelectric devices.
我们已经制造出具有可控光学反射强度和颜色的纳米纹理硅衬底。硅纳米孔具有光子俘获纳米结构,但折射率的变化突然,显示出暗镜面反射。纳米螺杆硅显示出渐变折射率光子俘获结构,使可见光范围内的漫反射低至 2.2%。通过调整 3D 纳米尺度硅结构,在 300-800nm 的波长范围内改变光学反射峰波长和强度,使表面具有不同的反射率和表观颜色。还研究了表面光学性质与光子俘获纳米结构空间特征之间的关系。还在同一衬底上展示了光子俘获结构与平面硅结构的集成。可调谐光子俘获硅结构在增强半导体光电器件的性能方面具有潜在的应用。