使用台式 X 射线源和反应条件下氧化铈的表面化学设计内部常压 AP-XPS。
Design of an in-house ambient pressure AP-XPS using a bench-top X-ray source and the surface chemistry of ceria under reaction conditions.
机构信息
Department of Chemistry and Biochemistry, University of Notre Dame, Notre Dame, IN 46556, USA.
出版信息
Chem Commun (Camb). 2012 Apr 21;48(32):3812-4. doi: 10.1039/c2cc17715c. Epub 2012 Mar 8.
A new in-house ambient pressure XPS (AP-XPS) was designed for the study of surfaces of materials under reaction conditions and during catalysis. Unique features of this in-house AP-XPS are the use of monochromated Al Kα and integration of a minimized reaction cell, and working conditions of up to 500 °C in gases of tens of Torr. Generation of oxygen vacancies on ceria and filling them with oxygen atoms were characterized in operando.
我们设计了一种新型的原位常压 XPS（AP-XPS），用于在反应条件下和催化过程中研究材料的表面。这种原位 AP-XPS 的独特之处在于使用了单色化的 Al Kα 和集成了最小化的反应池，以及在数十托的气体中高达 500°C 的工作条件。我们对氧化铈中氧空位的产生及其用氧原子填充的过程进行了实时研究。
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